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首页> 外文期刊>Magnetic resonance imaging: An International journal of basic research and clinical applications >Calculation of electric fields induced near metal implants by magnetic resonance imaging switched-gradient magnetic fields
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Calculation of electric fields induced near metal implants by magnetic resonance imaging switched-gradient magnetic fields

机译:磁共振成像开关梯度磁场在金属植入物附近感应电场的计算

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摘要

Electric (E) fields induced near metal implants by MRI switched-gradient magnetic fields are calculated by a new equivalent-circuit numerical technique. Induced E-field results are found for a metallic spinal-fusion implant consisting of two thin wires connected to the metallic case of a current generator as well as for its subsections: a bare U-shaped wire, an insulated U-shaped wire, a cut insulated wire, and a generator. The presence of the metallic implants perturbs the E field significantly. Near the ends of the bare U-shaped wire, the E field is 89.7 times larger than in the absence of the wire. The greatest E field concentration occurs near the ends of the cut insulated wire, where the E field is 196.7 times greater than in the absence of the wire. In all cases, the perturbation of the induced E field by the implanted wire is highly localized within a few diameters of the wire. (C) 1997 Elsevier Science Inc.
机译:通过一种新的等效电路数值技术,可以计算出MRI开关梯度磁场在金属植入物附近感应出的电场。对于由两根连接到电流发生器金属外壳的细线组成的金属脊柱融合植入物及其子部分,发现了感应电场结果:裸露的U形线,绝缘的U形线,剪掉绝缘线,然后用发电机。金属植入物的存在显着干扰了电场。在裸露的U形导线的末端附近,E场是没有导线时的89.7倍。最大的电场集中发生在切割的绝缘电线的末端附近,此处的电场比没有电线的情况下大196.7倍。在所有情况下,植入的导线对感应电场的扰动高度局限在导线的几个直径范围内。 (C)1997爱思唯尔科学公司

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