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首页> 外文期刊>HTM: Zeitschrift fur Werkstoffe Warmebehandlung Fertigung >In-line Process Control in the Active Screen Plasma Nitrocarburizing Using a Combined Approach Based on Infrared Laser Absorption Spectroscopy and Bias Power Management
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In-line Process Control in the Active Screen Plasma Nitrocarburizing Using a Combined Approach Based on Infrared Laser Absorption Spectroscopy and Bias Power Management

机译:基于红外激光吸收光谱法和偏置功率管理的组合方法在主动屏等离子体氮碳共渗过程中进行在线过程控制

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摘要

The active screen plasma nitrocarburizing (ASPNC) technology is an extension of the ASPN method in that carbon-bearing gases such as CH_4 are admixed to the N_2-H_2 process gas. Besides process gas composition and working pressure, a bias power applied to the component surface is an important parameter in the nitrocarburizing process governing the competing uptake between nitrogen and carbon on the metallic surface. A variation of the bias power during the treatment provides the possibility of the dynamic control of both the nitriding and the carburizing potential without change of process gas composition. A two-stage process was implemented to improve the quality of the compound layer. The application of advanced in-situ and non-intrusive spectroscopic method of laser absorption spectroscopy in the mid infrared spectral range provides the valuable information about the plasma chemical reactions in the afterglow plasma, supplying the absolute concentrations of stable and transient molecular species monitored direct in process. The amount of hydrogen cyanide (HCN) measured in-situ by QCLAS diagnostics was found to be a reliable parameter to control the carburizing potential of the nitrocarburizing atmosphere.
机译:主动筛分等离子体氮碳共渗(ASPNC)技术是ASPN方法的扩展,因为将含碳气体(例如CH_4)混合到N_2-H_2工艺气体中。除了工艺气体的成分和工作压力外,施加在零件表面的偏置功率也是氮碳共渗工艺中重要的参数,它决定着金属表面上氮与碳之间的竞争吸收。在处理过程中偏压功率的变化提供了在不改变工艺气体成分的情况下动态控制渗氮和渗碳势的可能性。实施了两个阶段的过程以提高复合层的质量。在中红外光谱范围内,先进的原位和非侵入式激光吸收光谱法的应用为余辉等离子体中的等离子体化学反应提供了有价值的信息,并提供了直接监测的稳定和瞬态分子种类的绝对浓度。处理。发现通过QCLAS诊断程序现场测量的氰化氢(HCN)量是控制氮碳共渗气氛渗碳潜力的可靠参数。

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