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Holographic grating formation in cationic photopolymers with dark reaction

机译:带有暗反应的阳离子光聚合物的全息光栅形成

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摘要

We propose a new formula to describe the dynamics of holographic grating formation under the low intensity pulse exposures in cationic photopolymers, in which the dark reaction contributes dominantly to the grating strength. The formula is based on the living polymerization mechanism and the diffusion-free approximation. The analytical solution indicates that the grating formation time depends on the termination rate constant, while the final grating strength depends linearly on the total exposure energy. The theoretical predictions are verified experimentally using the Aprilis HMC-400 mu m photopolymer. The results can provide guidelines for the control optimization of the holographic recording condition in practical applications.
机译:我们提出了一个新的公式来描述阳离子光敏聚合物在低强度脉冲曝光下全息光栅形成的动力学,其中暗反应对光栅强度起主要作用。该公式基于活性聚合机理和无扩散近似。分析结果表明,光栅的形成时间取决于终止速率常数,而最终的光栅强度与总的曝光能量线性相关。使用Aprilis HMC-400μm光敏聚合物通过实验验证了理论预测。结果可为实际应用中全息记录条件的控制优化提供指导。

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