首页> 外文期刊>Vakuum in Forschung und Praxis >Abrasion resistant coatings on plastics by plasma activated high rate deposition
【24h】

Abrasion resistant coatings on plastics by plasma activated high rate deposition

机译:等离子活化高速沉积在塑料上的耐磨涂层

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

Transparent plastics, e.g. PMMA or Polycarbonate, have low weight, optical clarity and processing benefits of a thermoplastic. A great disadvantage of such plastics is the lack of abrasion resistance. Therefore the plastics have to be protected for practical application. SiO{sub}2 layers perform very well as clear abrasion resistant layers. The typical layer thickness ranges from 1 μm to 6 μm depending on the required abrasion resistance. To get an abrasion resistance comparable to float glass a layer thickness of about 6 μm for SiO{sub}2 layers is needed. The layers are deposited by the FIAD-process (hollow cathode activated deposition). There the coating material is evaporated by an electron beam and is deposited on the substrate by adding reactive gases (e.g. O{sub}2, N{sub}2O or organic monomers) at the presence of an intensive plasma. A special hollow cathode, adapted to this process, is used as plasma source. The typical deposition rates are 300 nm/s to 600 nm/s for the deposition of SiO{sub}2.
机译:透明塑料,例如PMMA或聚碳酸酯具有重量轻,光学透明性和热塑性塑料的加工优势。这种塑料的最大缺点是缺乏耐磨性。因此,在实际应用中必须对塑料进行保护。 SiO {sub} 2层作为透明耐磨层表现非常好。根据所需的耐磨性,典型的层厚度范围为1μm至6μm。为了获得与浮法玻璃相当的耐磨性,对于SiO {sub} 2层需要约6μm的层厚度。通过FIAD工艺沉积这些层(空心阴极活化沉积)。在那里,涂料在强等离子体的存在下通过电子束蒸发并通过添加反应性气体(例如O {sub} 2,N {sub} 2O或有机单体)而沉积在基板上。适用于此工艺的特殊空心阴极用作等离子体源。对于SiO {sub} 2的沉积,典型的沉积速率为300nm / s至600nm / s。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号