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NANOSCALE ENGINEERING OF ALUMINIUM SURFACES

机译:铝表面纳米工程

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The development of regular finely spaced, arrays of metal ridges and troughs, i.e. nanotextures, by surface treatment of aluminium has been probed by atomic force microscopy (AFM) and transmission electron microscopy (TEM), assisted by radio frequency glow discharge optical emission spectrometry (rf GDOES). AFM reveals the grain orientation dependence of the texture and its increased dimensions with increased metal purity. TEM reveals atomic number contrast effects at the centres of metal ridges comprising the boundaries of the cells, thus implicating the composition and structure of the substrate. Enrichment of copper in the alloy immediately beneath the residual alumina film is evident in rf GDOES depth profiles; conversely, iron arid silicon, present at similar levels as copper are not detected. This suggests strongly that crucial impurities, i.e. silicon, are present as fine segregates in the alloy with a grain orientation dependent distribution originating from casting. The distribution of segregates controls the dissolution of the adjacent aluminium matrix in surface pretreatment, thus generating nanotextures of regular arrangements of metal ridges and troughs with an amorphous alumina film developed over the macroscopic aluminium surface.
机译:原子力显微镜(AFM)和透射电子显微镜(TEM)借助射频辉光放电光发射光谱法(AFM)探测了通过对铝进行表面处理而形成的规则间隔的金属脊和槽(即纳米纹理)阵列的发展(射频GDOES)。原子力显微镜揭示了纹理的晶粒取向依赖性及其随金属纯度提高而增加的尺寸。 TEM揭示了在包括细胞边界的金属脊的中心的原子序数对比效应,从而暗示了基底的组成和结构。在RF GDOES深度剖面中,可以看到残留氧化铝膜正下方的合金中铜的富集。相反,未检测到与铜相似水平的铁和硅。这强烈表明,关键杂质,即硅,以细的偏析物的形式存在于合金中,其晶粒取向依赖于铸造。偏析物的分布控制着表面预处理过程中相邻铝基体的溶解,从而生成了规则的金属脊和槽纳米结构,在宏观铝表面上形成了无定形氧化铝膜。

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