XPS and AES sputter-depth profiling at surfaces of biocompatible passivated Ti-based alloys: concentration quantification considering chemical effects

摘要

Ti-based materials are frequently used worldwide for orthopedic implants. New β-type or glassy alloys with nontoxic alloying elements are investigated with expected improved biofunctionality. The surface regions and surface layers formed at the materials are decisive for the integration of the implant in the body. Thus, the investigation of the surfaces with analytical methods such as XPS and AES is an essential task. We investigated such materials with different alloying elements after electrochemical passivation by both XPS and AES depth profiling. We discuss chemical changes due to the ion sputtering and motivate the use of non-differentiated spectra for AES quantification. The behavior of the alloy elements in the investigated depth profiles is discussed.