...
【24h】

Study of the end-group contribution to ToF-SIMS and G-SIMS spectra of poly (lactic acid) using deuterium labelling

机译:氘标记法研究端基对聚乳酸ToF-SIMS和G-SIMS光谱的贡献

获取原文
获取原文并翻译 | 示例

摘要

In this study, polymeric (MW 50 000) and oligomeric (MW 2000) poly (lactic acid) (PLA), both with and without end-group deuterium exchange, were analysed using static secondary ion mass spectrometry (SSIMS) to investigate the contribution of end-group-derived secondary ions to the SSIMS spectra. By monitoring the SSIMS intensities between the non-deuterated and deuterated PLA, it is evident that the only significant end-group-derived secondary ions are [nM + H](+) (n > 1) and C4H9O2+. The gentle-SIMS (G-SIMS) methodology was employed to establish that deuterated fragments were produced through low energy processes and were not the result of substantial rearrangements. It was noted that end-group-derived secondary ions had higher G-SIMS intensities for oligomeric PLA than polymeric PLA, showing that these secondary ions are simple fragment products that are not the result of rearrangement or degraded product ions. Copyright (C) 2007 John Wiley & Sons, Ltd.
机译:在这项研究中,使用静态次级离子质谱法(SSIMS)分析了具有和不具有端基氘交换的聚合物(MW 50000)和低聚(MW 2000)聚乳酸(PLA),以研究其贡献端基衍生的次级离子对SSIMS光谱的影响。通过监测未氘代和氘代PLA之间的SSIMS强度,很明显,唯一重要的源自端基的次级离子是[nM + H](+)(n> 1)和C4H9O2 +。采用了温和的SIMS(G-SIMS)方法来确定氘代碎片是通过低能过程产生的,而不是大量重排的结果。注意到,端基衍生的次级离子对低聚PLA的G-SIMS强度高于聚合PLA,表明这些次级离子是简单的碎片产物,不是重排或降解的产物离子的结果。版权所有(C)2007 John Wiley&Sons,Ltd.

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号