Monte Carlo simulation of spatial distribution of X rays in multifilm targets. III: optimum design as applied to W/Al-film targets

摘要

The brightness of the X-ray source in a W/Al-film target used for X-ray projection microscopy was studied by an approach using the Monte Carlo simulation. Since continuous X rays generated in a thin film have a specific angular distribution of emission, the brightness of the continuous X-ray source cannot simply be estimated on the assumption that the angular distribution is homogeneous. The newly developed approach using the Monte Carlo simulation enables the evaluation of the effective source size, angular distribution, and brightness of a continuous X-ray source with sufficient accuracy that it leads to the optimum design of a high-brightness X-ray source for uses such as X-ray projection microscopy. The Monte Carlo calculations were performed for W(Delta z)/Al (200 mu m)-film targets with different thicknesses of W film, Delta z, under bombardment of 60 kV electrons. The results have suggested an optimum design consisting of a W (2 mu m)/Al (200 mu m)-film target as most promising for providing an X-ray source of higher brightness than the W (5 mu m)/Al (200 mu m)-film target, which has already been in practice for X-ray projection microscopy. Copyright (c) 2006 John Wiley & Sons, Ltd.