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首页> 外文期刊>Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films >Monte Carlo simulation of x-ray generation and energy dissipation in a W/Cu target for optimum design of a high-power x-ray source
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Monte Carlo simulation of x-ray generation and energy dissipation in a W/Cu target for optimum design of a high-power x-ray source

机译:W / Cu靶材中X射线产生和能量耗散的蒙特卡洛模拟,以优化设计高功率X射线源

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摘要

Monte Carlo simulation of x-ray generation by electron impact was applied to a W/Cu target (tungsten W film on a copper substrate) to find the optimum conditions for a high-power x-ray source. To assess the performance of the high-power x-ray source, we propose using: (1) The total intensity of continuous x-rays emitted from the target, I-t0 = integral(lambdamin)(infinity) i(t0) (lambda)dlambda, where i(t0) (lambda) is a X-in spectrum of continuous x-rays emitted from the target under bombardment of an electron beam of primary energy E-0. (2) The cooling efficiency of the W/Cu target, which is gammaE(0) = sigma(Cu) . integral(DeltaW)(infinity)(dE/dz)(Cu) dz/[sigma(Cu).integral(DeltaW)(infinity)(dE/dz)(Cu) dz + sigmaw . integral(0)(DeltaW) (dE/dz)(W)dz] where (dE/dz)(j) and sigma(j) are the in-depth energy dissipation in a target of element j and the thermal conductivity of element j, respectively, in the W/Cu target with tungsten film thickness ATV. Both I-E0 and gamma(E0) were obtained from Monte Carlo calculations for different tungsten film thicknesses by varying the incidence angle of the electron beam and the take-off angle of the x-rays according to the primary energy levels of the electron beam. Copyright (C) 2002 John Wiley Sons, Ltd. [References: 15]
机译:将电子撞击产生的X射线的蒙特卡罗模拟应用于W / Cu靶(铜基板上的钨W膜),以找到高功率X射线源的最佳条件。为了评估高功率X射线源的性能,我们建议使用:(1)从目标发射的连续X射线的总强度I-t0 =积分(lambdamin)(无限大)i(t0)( λdlambda,其中i(t0)(λ)是在一次能量为E-0的电子束轰击下从目标发射的连续X射线的X-in光谱。 (2)W / Cu靶材的冷却效率为gammaE(0)= sigma(Cu)。积分(DeltaW)(无穷大)(dE / dz)(Cu)dz / sigma(Cu)。积分(DeltaW)(无穷大)(dE / dz)(Cu)dz + sigmaw。积分(0)(DeltaW)(dE / dz)(W)dz],其中(dE / dz)(j)和sigma(j)是元素j的目标中的深度能量耗散和元素的热导率j分别在具有钨膜厚度的ATV的W / Cu靶中。 I-E0和gamma(E0)都是通过根据电子束的一次能级改变电子束的入射角和X射线的发射角,从不同的钨膜厚度的蒙特卡洛计算中获得的。版权所有(C)2002 John Wiley Sons,Ltd. [参考:15]

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