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Effect of process parameters on the structure of Si-Ti-N nanostructured coatings deposited by hypersonic plasma particle deposition

机译:工艺参数对高超声速等离子体沉积Si-Ti-N纳米结构涂层结构的影响

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Si-Ti-N nanostructured coatings were synthesized by inertial impaction of nanoparticles using a process called hypersonic plasma particle deposition (HPPD). A study detailing the effect of plasma gases showed that in the case of an Ar+H-2 plasma gas mixture, crystalline phases in the coatings consisted of TiN, TiSi2, and Ti5Si3. When the system was switched to a plasma gas mixture of Ar+N-2, the only crystalline phase was TiN. Transmission electron microscopy confirmed the presence of TiN crystallites in an amorphous matrix. Warren-Averbach analysis indicated the average size of the TiN crystallites to be 14.9 nm. In separate experiments with the same conditions, aerodynamic lenses were used to deposit particles directly onto TEM grids. We observed agglomerated structures with an Ar+N-2 plasma, while with an Ar+H-2 plasma we found discrete TiSix and TiN, particles. In-situ particle diagnostics indicated only small changes in the particle size distributions when the plasma gases were changed. (c) 2005 Published by Elsevier B.V.
机译:Si-Ti-N纳米结构涂层是通过使用超音速等离子体沉积(HPPD)的过程惯性撞击纳米颗粒而合成的。一项详细研究等离子气体影响的研究表明,在Ar + H-2等离子气体混合物的情况下,涂层中的晶相由TiN,TiSi2和Ti5Si3组成。当将系统切换为Ar + N-2的等离子气体混合物时,唯一的结晶相是TiN。透射电子显微镜证实在非晶基质中存在TiN微晶。 Warren-Averbach分析表明,TiN晶体的平均尺寸为14.9 nm。在具有相同条件的单独实验中,使用空气动力学透镜将颗粒直接沉积到TEM网格上。我们观察到具有Ar + N-2等离子体的团聚结构,而在Ar + H-2等离子体中,我们发现了离散的TiSix和TiN颗粒。原位颗粒诊断表明,当改变等离子气体时,粒径分布仅发生很小的变化。 (c)2005年由Elsevier B.V.

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