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A surface analysis on oxygen plasma-cleaned gold pattern-plated substrates for wire bondability

机译:氧等离子体清洗的镀金图案基材的表面分析,用于引线键合

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The surface properties of the bond pads of gold pattern-plated (GPP) substrates cleaned by oxygen plasmas dependent on the wire bondability with gold wires are investigated. Optical microscope and scanning electron microscopy are used to interpret the surface morphology of the bond pads. Auger electron spectroscopy and X-ray photoelectron spectroscopy are applied to analyze the surface compositions dependent on the depths and the surface chemical bonds of the bond pads. Oxygen plasmas are found that can reduce the surface impurities such as C, O and Cu for GPP pad and enhance the bonding strength with gold wires. The surface impurities such as Cu, Ni and O are found to cause no gold residue on GPP pad after the wire peel test due to Cu2O/ CuO and NiO are formed at GPP pad. As the high contents of C and O are observed at the top surface of GPP pad with the contaminants of Cu2O/CuO and NiO, the bond pad will be non-bondable with gold wires. (C) 2003 Elsevier Science B.V. All rights reserved. [References: 19]
机译:研究了通过氧等离子体清洗的金图案镀金(GPP)基板的焊盘的表面性能,取决于其与金线的键合能力。光学显微镜和扫描电子显微镜用于解释焊盘的表面形态。俄歇电子能谱和X射线光电子能谱被用于分析取决于键合垫的深度和表面化学键的表面组成。发现氧等离子体可减少GPP焊盘的表面杂质(如C,O和Cu)并增强与金线的结合强度。由于在GPP焊盘上形成了Cu2O / CuO和NiO,在进行线剥测试后,发现表面杂质(如Cu,Ni和O)不会在GPP焊盘上引起金残留。由于在GPP焊盘的顶部表面观察到C和O的高含量,其中包含Cu2O / CuO和NiO的污染物,因此焊盘将无法与金线键合。 (C)2003 Elsevier Science B.V.保留所有权利。 [参考:19]

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