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首页> 外文期刊>Surface & Coatings Technology >Temperature behavior of atmospheric-pressure non-equilibrium microwave discharge plasma jets for poly(ethylene naptharate)-surface processing
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Temperature behavior of atmospheric-pressure non-equilibrium microwave discharge plasma jets for poly(ethylene naptharate)-surface processing

机译:大气压非平衡微波放电等离子体射流对聚(萘甲酸乙烯酯)表面处理的温度行为

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摘要

To understand the mechanism of surface processing using an atmospheric-pressure non-equilibrium. microwave discharge plasma jet, we used optical emission spectroscopy to measure the vibrational and rotational temperatures of plasma. A microwave (2.45 GHz) power Supply Was used to excite the plasma. The vibrational and rotational temperatures in the plasma were measured at approximately 0.18 eV and 0.22 eV. We also conducted plasma surface processing of polyethylene naphthalate (PEN) film to measure changes in the water contact angle before and after the PEN film was processed, as well as while the rotational temperature of the plasma increased. The hydrophilicity of the PEN film surface was found to improve as the rotational temperature of the plasma increased.
机译:了解使用大气压非平衡进行表面处理的机理。微波放电等离子体射流,我们使用光发射光谱法测量等离子体的振动和旋转温度。微波(2.45 GHz)电源用于激发等离子体。测得的等离子体的振动和旋转温度分别约为0.18 eV和0.22 eV。我们还进行了聚萘二甲酸乙二醇酯(PEN)膜的等离子表面处理,以测量PEN膜处理前后的水接触角的变化以及等离子旋转温度的升高。发现PEN膜表面的亲水性随着等离子体的旋转温度升高而提高。

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