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Preparation and characterization of Cr-P coatings by electrodeposition from trivalent chromium electrolytes using malonic acid as complex

机译:以丙二酸为络合物由三价铬电解质电沉积制备和表征Cr-P涂层

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摘要

Cr-P coatings were prepared by electrodeposition from trivalent chromium plating bath using malonic acid as complex. The influences of bath composition on the trivalent chromium electrodeposition process and deposited coating properties were studied. The effects of plating parameters such as current density, bath pH and plating time on structure and morphology of deposited coatings were investigated in detail. XRD, SEM, EDAX and XPS techniques were used to characterize the Cr-P deposited coatings. Results show that the composition, microstructure and surface morphology of the Cr-P coatings depend on bath composition and plating conditions including bath pH, current density, plating time, etc. Results of EDAX and XPS indicate that the deposited coatings contain Cr(s), Cr(III), phosphorus, oxygen and carbon. The optimum bath composition was obtained using malonic acid as complex and the mechanism of Cr-P electrodeposition was analyzed. The optimum plating parameters for good-quality chromium deposited coating are pH 2-3, current density 3-12 dm(2), temperature 35 degrees C and Ti/IrO2 as anode. These results may be of great practical and theoretical significance for further improvement of trivalent chromium plating process. (c) 2006 Elsevier B.V All rights reserved.
机译:Cr-P涂层是通过使用丙二酸作为络合物从三价铬电镀液中进行电沉积制备的。研究了镀液组成对三价铬电沉积工艺和沉积涂层性能的影响。详细研究了电镀参数,例如电流密度,镀液pH值和电镀时间对沉积涂层的结构和形态的影响。 XRD,SEM,EDAX和XPS技术用于表征Cr-P沉积涂层。结果表明,Cr-P涂层的组成,微观结构和表面形态取决于镀液成分和镀液条件,包括镀液pH,电流密度,镀时间等。EDAX和XPS结果表明,沉积的镀层中含有Cr。 ,Cr(III),磷,氧和碳。以丙二酸为配合物得到最佳的镀液组成,分析了Cr-P电沉积机理。高质量镀铬涂层的最佳电镀参数是pH 2-3,电流密度3-12 dm(2),温度35摄氏度和以Ti / IrO2为阳极。这些结果对进一步改进三价铬镀层工艺具有重要的实践意义和理论意义。 (c)2006 Elsevier B.V保留所有权利。

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