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首页> 外文期刊>Toxicology Research >Specific histone modifications were associated with the PAH-induced DNA damage response in coke oven workers
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Specific histone modifications were associated with the PAH-induced DNA damage response in coke oven workers

机译:特定的组蛋白修饰与PAH导致炼焦炉工人的DNA损伤反应有关

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To investigate whether polycyclic aromatic hydrocarbon (PAH) exposure is associated with specific histone modifications and whether DNA damage triggers epigenetic alterations, we recruited 190 male workers with occupational exposure to PAHs and 100 male control workers from Benxi Steel Plant, Liaoning province, China. Urinary 1-hydroxypyrene (1-OHP), DNA damage, specific histone modification levels and the expression of selected DNA damage response (DDR) genes were measured in peripheral blood lymphocytes (PBLCs) of the subjects. The results showed that trimethylated Lys 27 of histone H3 (H3K27me3) and trimethylated Lys 36 of histone H3 (H3K36me3) were elevated in the PAH-exposed group (both P < 0.001), while trimethylated Lys H3 of histone H3 (H3K4me3) was decreased compared to the unexposed group (P < 0.001). Notably, H3K36me3 was positively associated with the level of internal exposure marker 1-OHP (beta = 0.197; P < 0.001) and the degree of DNA damage (beta = 0.175; P < 0.001) in all subjects, indicating that the PAH-induced DNA damage response might be mediated by H3K36me3 and/or H3K4me3 modifications. Particularly, the ChIP-qPCR assay revealed that the modifications of H3K36me3 were enriched in the gene body of DDR genes, MGMT and MLH1. The up-regulation of MGMT and MLH1 was correlated with the elevated H3K36me3 in the PAH-exposed workers (P < 0.001). Collectively, we revealed that H3K36me3 could be an indicator of PAH exposure and might be involved in the transcriptional regulation of DNA repair genes in response to DNA damage.
机译:为了调查多环芳烃(PAH)暴露是否与特定的组蛋白修饰有关,以及DNA损伤是否引发表观遗传学改变,我们从中国辽宁省本溪钢铁厂招募了190名暴露于PAHs的男性工人和100名男性对照工人。在受试者的外周血淋巴细胞(PBLC)中测量了尿中的1-羟基py(1-OHP),DNA损伤,特定的组蛋白修饰水平和选定的DNA损伤应答(DDR)基因的表达。结果显示,暴露于PAH的组中,组蛋白H3的三甲基化Lys 27(H3K27me3)和组蛋白H3的三甲基化Lys 36(H3K36me3)升高(均P <0.001),而组蛋白H3的三甲基化Lys H3(H3K4me3)降低与未暴露组相比(P <0.001)。值得注意的是,在所有受试者中,H3K36me3与内部暴露标记物1-OHP(β= 0.197; P <0.001)和DNA损伤程度(β= 0.175; P <0.001)呈正相关,表明PAH诱导DNA损伤反应可能是由H3K36me3和/或H3K4me3修饰介导的。尤其是,ChIP-qPCR分析显示H3K36me3的修饰在DDR基因MGMT和MLH1的基因体中富集。 MGMT和MLH1的上调与PAH暴露工人中H3K36me3升高相关(P <0.001)。总的来说,我们揭示了H3K36me3可能是PAH暴露的指标,并且可能参与DNA修复基因的转录调控以响应DNA损伤。

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