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Molecular dynamics simulation of stress distribution and microstructure evolution ahead of a growing crack in single crystal nickel

机译:单晶镍裂纹扩展前的应力分布和微观结构演化的分子动力学模拟

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摘要

The microstructure evolution and stress distribution characteristics of a pre-cracked single crystal nickel at different temperatures are studied by molecular dynamics (MD) simulation. The simulation results indicate that the crack propagation process and stress distribution characteristics are closely related to the change of temperature inducing the microstructure evolution ahead of a growing crack in single crystal nickel. At 0. K, the crack propagates rapidly without inducing microstructure evolution, the stress concentration is always at the crack tip of a growing crack throughout the crack propagation process. The crack propagation becomes slow and accompanies with microstructure evolution at elevated temperature, firstly crack tip blunting occurs at a certain distance ahead of crack tip due to the dislocation emission, then void nucleation and growth as well as the generation of slip bands. The microstructure evolution ahead of crack tip induces the change of stress distribution, the high stress value occurs at the site of the microstructure evolution (dislocation emission, void nucleation and the generation of slip bands), and a rather large plastic deformation range ahead of crack tip is necessary for the generation of slip bands. The failure process of single crystal nickel show the different crack propagation dynamics and plastic behavior, which are linked to the void nucleation and generation of slip bands ahead of the crack tip at elevated temperature.
机译:通过分子动力学(MD)模拟研究了预裂解单晶镍在不同温度下的组织演变和应力分布特征。仿真结果表明,裂纹的扩展过程和应力分布特征与温度的变化密切相关,温度的变化会引起单晶镍裂纹扩展前组织的演变。在0 K处,裂纹在不引起微观结构演变的情况下迅速传播,应力集中始终在整个裂纹扩展过程中始终处于裂纹扩展的尖端。裂纹的扩展变得缓慢,并伴随着高温下组织的演变,首先由于位错释放,裂纹尖端在裂纹尖端之前一定距离处发生钝化,然后产生空核和长大,并产生滑移带。裂纹尖端前方的微观结构演化引起应力分布的变化,高应力值发生在微观结构演化的位置(位错发射,空核和滑移带的产生),并且裂纹之前的塑性变形范围相当大尖端对于产生滑带是必要的。单晶镍的失效过程表现出不同的裂纹扩展动力学和塑性行为,这与高温下裂纹尖端处的空核和滑动带的产生有关。

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