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Vanadium Oxide Overlayers on Vicinal Rh(15 15 13): The Influence of Surface Steps

机译:相邻Rh(15 15 13)上的氧化钒覆盖层:表面台阶的影响

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The growth of vanadium oxide monolayer films on a vicinal Rh(111) surface has been examined by scanning tunneling microscopy, low-energy electron diffraction, and X-ray photoelectron spectroscopy to determine the role of substrate steps on the oxide overlayer structures. While similar local V-O building blocks as on the flat Rh(111) surface are found on the stepped surface as a function of the chemical potential of oxygen, the effects of the interfacial chemistry of step atoms and of the strain relief at step edges lead to novel oxide structures that are not observed on the extended (111) surface. Specifically, the high chemical affinity of step atoms toward oxygen induces a reorientation of pyramidal VO5 units at high chemical potentials of oxygen generating a unique oblique superstructure near the step edges. For more reducing conditions a (2 X 2) surface-V_2O_3 phase is formed, which is stabilized by the strain relief at step edges and is therefore not observed on the flat Rh(111) surface.
机译:通过扫描隧道显微镜,低能电子衍射和X射线光电子能谱检查了相邻的Rh(111)表面上的钒氧化物单层膜的生长,以确定衬底台阶在氧化物覆盖层结构上的作用。虽然在台阶表面上发现了与平坦Rh(111)表面类似的局部VO构造块,这是氧气化学势的函数,但台阶原子的界面化学作用和台阶边缘处的应变消除的影响导致在扩展(111)表面上未观察到的新型氧化物结构。具体而言,阶跃原子对氧的高化学亲和力在氧的高化学势下引起金字塔形VO5单元的重新定向,从而在阶跃边缘附近产生独特的倾斜超结构。对于更多的还原条件,形成(2 X 2)表面-V_2O_3相,该相通过台阶边缘处的应力释放而稳定,因此在平坦的Rh(111)表面上未观察到。

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