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首页> 外文期刊>The Annals of occupational hygiene. >Analysis of lognormally distributed exposure data with repeated measures and values below the limit of detection using SAS.
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Analysis of lognormally distributed exposure data with repeated measures and values below the limit of detection using SAS.

机译:对数正态分布的暴露数据进行分析,采用重复测量和数值低于使用SAS的检测极限。

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摘要

Studies of determinants of occupational exposure frequently involve left-censored lognormally distributed data, often with repeated measures. Left censoring occurs when observations are below the analytical limit of detection (LOD); repeated measures data results from taking multiple measurements on the same worker. A common method of dealing with this type of data has been to substitute a value (such as LOD/2) for the censored data followed by statistical analysis using the 'usual' methods. Recently, maximum likelihood estimation (MLE) methods have been employed to reduce bias associated with the substitution method. We compared substitution and MLE methods using simulated lognormally distributed exposure data subjected to varying amounts of censoring using two procedures available in SAS: LIFEREG and NLMIXED. In these simulations, the MLE method resulted in less bias and performed well even for censoring up to 80%, whereas the substitution method resulted in considerable bias. We illustrate the NLMIXED procedure using a dataset of chlorpyrifos air measurements collected from termiticide applicators on consecutive days over a 5-day workweek. We provide sample SAS code for several situations including one and two groups, with and without repeated measures, random slopes, and nested random effects.
机译:对职业暴露的决定因素的研究经常涉及左删失的对数正态分布数据,并且经常采用重复测量的方法。当观测值低于检测的分析极限(LOD)时,将进行左审查。重复测量数据来自对同一工人的多次测量。处理此类数据的一种常用方法是用一个值(例如LOD / 2)代替检查数据,然后使用“常规”方法进行统计分析。最近,已采用最大似然估计(MLE)方法来减少与替代方法相关的偏差。我们使用SAS中可用的两个过程:LIFEREG和NLMIXED,使用经过变化数量的审查的模拟对数正态分布的暴露数据比较了替代方法和MLE方法。在这些模拟中,MLE方法产生的偏差较小,即使对高达80%的审查也表现良好,而替代方法产生的偏差较大。我们使用连续5天从杀白蚁剂施用器收集的毒死rif空气测量数据集说明了NLMIXED程序。我们为几种情况提供了示例SAS代码,包括一组和两组,有无重复测量,随机斜率和嵌套随机效应。

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