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首页> 外文期刊>Chemistry of Materials: A Publication of the American Chemistry Society >Alignment and Morphology Control of Ordered Mesoporous Silicas in Anodic Aluminum Oxide Channels by Electrophoretic Deposition
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Alignment and Morphology Control of Ordered Mesoporous Silicas in Anodic Aluminum Oxide Channels by Electrophoretic Deposition

机译:电泳沉积法在阳极氧化铝通道中有序介孔二氧化硅的排列和形貌控制

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摘要

Reproducible alignment and complete inclusion of ordered mesoporous structures into anodic aluminum oxide (AAO) is still a challenging nanofabrication process. Hierarchical nanostructures of ordered mesoporous silica (OMS) in AAO channels were prepared directly on conducting substrates by electrophoretic deposition of colloidal silica nanoparticles in sols containing a structure directing agent. The mesoporous silica structures were found to be highly dependent on the magnitude of the applied electric field and moderately dependent on the overall deposition time. At low applied voltages, disordered porous tubules are formed. At an applied voltage of 5 V and deposition times in excess of 7 h, ordered mesoporous silicas fill the AAO channels, and the OMS pores display the onset of axial alignment with respect to the AAO pore. The deposition of the mesoporous silica structures with preferential axial alignment on conductive supports is described by a new self-assembly mechanism based on selective solvent exclusion due to confined particle packing of colloidal silica.
机译:可重整的对准以及将有序介孔结构完全包含到阳极氧化铝(AAO)中仍然是一个具有挑战性的纳米加工过程。通过在含有结构导向剂的溶胶中电泳沉积胶体二氧化硅纳米粒子,可以在导电基底上直接制备AAO通道中有序介孔二氧化硅(OMS)的层级纳米结构。发现中孔二氧化硅结构高度依赖于所施加电场的大小,并且适度依赖于总沉积时间。在低施加电压下,形成无序的多孔小管。在施加的5 V电压和超过7小时的沉积时间下,有序介孔二氧化硅填充了AAO通道,OMS孔相对于AAO孔显示出轴向排列的开始。通过基于选择性溶剂排阻的新型自组装机制描述了具有优先轴向排列的介孔二氧化硅结构在导电载体上的沉积,这是由于胶体二氧化硅的受限颗粒堆积所致。

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