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Mass density of polystyrene thin films measured by twin neutron reflectivity

机译:用双中子反射率测量的聚苯乙烯薄膜的质量密度

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Neutron reflectivity measurements on polystyrene thin films (6.5-79.0 nm thick) supported on silicon substrates indicate that the mass density is near the bulk value regardless of film thickness. To account for possible inaccuracies arising from sample misalignment, reflectivity measurements were made both from the free-surface and silicon-substrate sides of the thin film, a method termed twin reflectivity. For films spin coated on the hydrogen-terminated silicon surface the relative uncertainty in the density measurement was on the order of 1%, but for films spin coated onto the silicon native-oxide surface the analysis was more difficult because of subtleties in data fitting due to the oxide layer. Nevertheless, within the limits of greater uncertainty, these films also showed no systematic change in density with thickness. (C) 1998 American Institute of Physics. [References: 40]
机译:在硅基板上支撑的聚苯乙烯薄膜(6.5-79.0 nm厚)上的中子反射率测量表明,无论膜厚度如何,质量密度都接近体积值。为了解决由样品未对准引起的可能的误差,从薄膜的自由表面和硅衬底两面都进行了反射率测量,这种方法称为双反射率。对于旋涂在氢封端的硅表面上的薄膜,密度测量的相对不确定度约为1%,但是对于旋涂在硅天然氧化物表面上的薄膜,由于数据拟合的微妙性,分析更加困难氧化层。然而,在更大不确定性的范围内,这些膜还没有显示出密度随厚度的系统变化。 (C)1998美国物理研究所。 [参考:40]

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