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Reflective optical bi-stability of antiferromagnetic films

机译:反铁磁膜的反射光学双稳定性

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We investigate one magnetically nonlinear response of antiferromagnetic (AF) films to incident electromagnetic waves, or the reflective optical bi-stability (ROB). Such geometry is used, where the AF anisotropy axis and external static magnetic field both are parallel to the film surfaces and normal to the incident plane. For TE incident waves with the electric component transverse to the incident plane, the ROB of the AF film with the absorption is calculated, but the case of TM incident waves is neglected since no magnetic nonlinearity is induced in this geometry. The bi-stability is completely different in the two resonant-frequency vicinities. Two kinds of bi-stability are found in the higher vicinity, and their features versus incident power are opposite. We also find that there are critical incident angle and critical film thickness for the existence of bi-stability. The bi-stability disappears when the film thickness or incident angle exceeds its critical value. Because the properties of bi-stable reflection sensitively depend on the external field and the incident angle, this bi-stability can be easily modulated by means of changing these quantities.
机译:我们研究了反铁磁(AF)膜对入射电磁波或反射光学双稳定性(ROB)的一种磁性非线性响应。使用这样的几何形状,其中AF各向异性轴和外部静磁场都平行于胶片表面并且垂直于入射平面。对于具有垂直于入射平面的电子分量的TE入射波,计算了具有吸收率的AF膜的ROB,但由于在该几何形状中未引起磁性非线性,因此忽略了TM入射波的情况。在两个谐振频率附近,双稳定性完全不同。在较高的区域中发现了两种双稳定性,它们的特征与入射功率的关系相反。我们还发现,存在双稳态的临界入射角和临界膜厚。当膜厚度或入射角超过其临界值时,双稳定性消失。由于双稳态反射的特性敏感地取决于外部场和入射角,因此可以通过更改这些量轻松地调节这种双稳定性。

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