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首页> 外文期刊>Textures and Microstructures >TEXTURE ANALYSIS IN LD-MOCVD PROCESSED THIN FILM GIANT MAGNETORESISTANT (LaM)MnO_3 MATERIALS
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TEXTURE ANALYSIS IN LD-MOCVD PROCESSED THIN FILM GIANT MAGNETORESISTANT (LaM)MnO_3 MATERIALS

机译:LD-MOCVD薄膜巨磁阻(LaM)MnO_3材料的织构分析

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摘要

Thin films of La_(0.67)M_(0.33)MnO_3 (M = Sr), LSMO were deposited on three different sub-strates of LAO, Sapphire, and Y-ZrO_2 (YSZ) using metal-organic chemical vapor deposition methods. The effect of texture and orientation on the resistance (0 and 6 T) and magnetoresistance (MR) of (LSMO) thin films on various substrates has been investi-gated. X-ray pole figures were measured using Philips X'Pert X-ray diffractometer equipped with the PopLa analysis package. A direct correlation was observed between the lattice mismatch strain and the Structure of the thin film growth. LSMO/LAO seems to be the most perfect system for epitaxial growth due to the negligible lattice-mismatch ( 2 percent). The dominant orientation changes for the films deposited on LAO [100] and LAO [110] substrates while the transition temperature from ferromagnetic to paramagnetic state of the film on LAO [110] is 50K higher than that of the film on LAO [100]. The MR data and TMI temperature were measured using standard 4-point resistivity devices and SQUID.
机译:La_(0.67)M_(0.33)MnO_3(M = Sr),LSMO薄膜使用金属有机化学气相沉积方法沉积在LAO,蓝宝石和Y-ZrO_2(YSZ)的三个不同的基板上。已经研究了织构和取向对各种基材上(LSMO)薄膜的电阻(0和6 T)和磁阻(MR)的影响。 X射线极图使用配备PopLa分析软件包的Philips X'Pert X射线衍射仪测量。在晶格失配应变与薄膜生长的结构之间观察到直接相关。由于可忽略的晶格失配(2%),LSMO / LAO似乎是最适合外延生长的系统。当沉积在LAO [100]和LAO [110]上的薄膜的主取向发生变化时,LAO [110]上的薄膜从铁磁态到顺磁态的转变温度要比LAO [100]上的薄膜高50K。使用标准的4点电阻率设备和SQUID测量MR数据和TMI温度。

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