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Emission from a Sulfur-Hexafluoride Volume Discharge Induced by Attachment Instability

机译:附着不稳定性引起的六氟化硫体积放电产生的排放

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摘要

Characteristics of a low-pressure volume discharge in SF_63 are investigated. The discharge with a spherical anode-plane cathode electrode system was induced by attachment instability. It is found that applying a dc voltage (U_(ch) ≤ 1.3 kV) to the anode in the absence of a confining dielectric wall results in the ignition of a repetitive discharge (f = 0.1-120 kHz). The spatial, frequency, and current-voltage characteristics of the volume discharge; plasma emission in the spectral range 200-700 nm; and the waveforms of the discage voltage, current, and plasma emission are investigated. It is shown that the plasma under study exists in the form of a domain (autosoliton) and that the volume discharge is self-induced because, during attachment instability, the plasma itself acts as a switch enabling repetitive pulsed operation. The results obtained can be applied to studying the physics and technology of electric-discharge chemical HF (DF) lasers based on nonchain reactions and to developing high-aperture low-pressure repetitive Ar-, Kr-, and Xe-fluoride lamps with low-corrosive working media (low-pressure mixtures of Ar, Kr, and Xe with SF_6).
机译:研究了SF_63低压低压排气的特性。球形阳极-平面阴极电极系统的放电是由附着不稳定性引起的。已经发现,在没有约束电介质壁的情况下向阳极施加直流电压(U_(ch)≤1.3 kV)会导致重复放电(f = 0.1-120 kHz)。体积放电的空间,频率和电流-电压特性; 200-700 nm光谱范围内的等离子体发射;并研究了盘电压,电流和等离子体发射的波形。结果表明,所研究的等离子体以畴(自孤子)的形式存在,并且体积放电是自感应的,因为在附着不稳定期间,等离子体本身充当开关,可进行重复脉冲操作。所得结果可用于研究基于非链式反应的放电化学HF(DF)激光器的物理和技术,并可用于开发具有低辐射强度的高孔径低压重复性Ar,Kr和Xe氟化物灯。腐蚀性工作介质(Ar,Kr和Xe与SF_6的低压混合物)。

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