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首页> 外文期刊>Quantum electronics >Generation of hard x-ray radiation by irradiation of porous silicon with ultraintense femtosecond laser pulses
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Generation of hard x-ray radiation by irradiation of porous silicon with ultraintense femtosecond laser pulses

机译:通过用超强飞秒激光脉冲照射多孔硅来产生硬X射线辐射

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摘要

Irradiation of a porous (with porosity in excess of 70%) silicon target with femtosecond laser pulses of 10~(16) W cm~(-2) intensity increased by a factor of 3.5 the efficiency of generation of hard x-ray radiation with photon energies E > 2.5 keV. The increase was 30-fold for E > 8 keV. The relationship between this effect and the parameters of the luminescence emitted by porous silicon was investigated.
机译:飞秒强度为10〜(16)W cm〜(-2)的飞秒激光脉冲对多孔(孔隙率超过70%)的硅靶的照射,硬X射线辐射的产生效率提高了3.5倍光子能量E> 2.5 keV。对于E> 8 keV,增加了30倍。研究了该效应与多孔硅发射的发光参数之间的关系。

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