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Single-bath electrodeposition of chromium-nickel compositionally modulated multilayers (CMM) from a trivalent chromium bath

机译:单浴电沉积三价铬浴中的铬镍组成调制多层(CMM)

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摘要

Electrodeposition of Cr-Ni compositionally modulated multilayers was investigated. It was realized using the single-bath technique under galvanostatic conditions. The structure was characterized by scanning electron microscopy (SEM) and opticalmicroscopy. Deposit composition was determined by energy dispersive X-ray (EDX) analysis. Cr-Ni multilayers with distinct sublayers can be produced by single-bath electrodeposition. Nickel and chromium layer thicknesses are kept equal and vary from 2μmto 0.3μm. Nickel sublayers are pure, while chromium sublayers contain a small amount of nickel (<10 wt pct). These deposits should exhibit improved characteristics compared with chromium without nickel deposits, such as corrosion and wear resistance.
机译:研究了Cr-Ni组成调制多层的电沉积。它是在恒电流条件下使用单浴技术实现的。该结构通过扫描电子显微镜(SEM)和光学显微镜表征。沉积物组成通过能量色散X射线(EDX)分析确定。可以通过单浴电沉积来生产具有不同子层的Cr-Ni多层。镍和铬层的厚度保持相等,范围从2μm到0.3μm。镍子层是纯净的,而铬子层则包含少量的镍(<10 wt%)。与没有镍沉积物的铬相比,这些沉积物应表现出改善的特性,例如耐蚀性和耐磨性。

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