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Properties of nanoporous organosilicate hybrid thin films with a bimodal pore size distribution

机译:具有双峰孔径分布的纳米多孔有机硅酸盐杂化薄膜的性能

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Low dielectric poly[methylsilsesquioxane-ran-trifluoropropylsilsesquioxane-ran-(2,4,6,8-tetramethyl-2,4,6,8-tetraethylenecyclotetrasiloxane)silsesquioxane]s (P[M-ran-TFP-ran-(TCS)]SSQs) having various compositions were synthesized using trifluoropropyl trimethoxysilane,methyl trimethoxysilane and 2,4,6,8-tetramethyl-2,4,6,8-tetra(trimethoxysilylethyl)cyclotetrasiloxane.The chemical composition of the polymers and the content of SiOH end-groups were controlled by adjusting the reaction conditions,and they were characterized by ~1H-NMR.The thermally decomposable trifluoropropyl groups on the P[M-ran-TFP-ran-(TCS)]SSQ backbone and heptakis(2,3,6-tri-O-methyl)-beta-cyclodextrin (CD) were employed as pore generators.The dielectric constants of the porous CD/P[M-ran-TFP-ran-(TCS)]SSQ films were in the range 2.0-2.7 (at 100 kHz) depending on the concentration of the porogens,and showed no change over 4 days under aqueous conditions.The pore size of the films showed a bimodal distribution,with diameters of ca 0.5-l.0nm for those originating from the trifluoropropyl groups and 1.7nm from the CD.The elastic modulus and hardness of the 30 vol% CD-blended film with a dielectric constant of 2.26 were 2.40 and 0.38 GPa,respectively,as determined by a nanoindenter.
机译:低介电聚[甲基倍半硅氧烷-三氟丙基倍半硅氧烷-((2,4,6,8-四甲基-2,4,6,8-四亚乙基环四硅氧烷)倍半硅氧烷] s(P [M-ran-TFP-ran-(TCS)用三氟丙基三甲氧基硅烷,甲基三甲氧基硅烷和2,4,6,8-四甲基-2,4,6,8-四(三甲氧基甲硅烷基乙基)环四硅氧烷合成具有不同组成的] [SSQs]。通过调节反应条件控制端基,并通过〜1H-NMR表征。P[M-ran-TFP-ran-(TCS)] SSQ主链和庚基上的可热分解的三氟丙基(2,3 1,6-三-O-甲基)-β-环糊精(CD)作为致孔剂。多孔CD / P [M-ran-TFP-ran-(TCS)] SSQ薄膜的介电常数在取决于致孔剂的浓度,为2.0-2.7(在100 kHz下),并且在水性条件下在4天之内没有变化。膜的孔径呈双峰分布,且源自三氟丙基的直径约为0.5-1.0nm,距CD的直径约为1.7nm。介电常数为2.26的30vol%CD混合膜的弹性模量和硬度分别为2.40和0.38 GPa,由纳米压头确定。

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