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New W-Cu powders offer opportunities for MIM in electronic applications

机译:新型W-Cu粉末为MIM在电子应用中提供了机会

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摘要

The properties of tungsten-copper (W-Cul alloys with a Cu content of 20% meet the requirements of designers in electronic applications such as heat sinks, high power diodes, etc. which must provide a combination of low coefficient of thermal expansion (CTE) and good thermal conductivity. W-Cu parts are usually made by Cu infiltration of a pre-sintered W skeleton. The only competitive alternative to Cu-infiltration appears to be pressing and sintering or MIM, if a fine and uniform distribution of a copper phase can be achieved in the sintered material so as to reach the required CTE values.
机译:钨铜(W-Cul合金的Cu含量为20%)的性能满足电子设备设计人员的要求,例如散热器,高功率二极管等,这些应用必须提供低热膨胀系数(CTE)的组合W-Cu零件通常由预烧结的W骨架中的Cu浸渗制成,如果铜的细小均匀分布,则压制和烧结或MIM可能是替代Cu浸渗的唯一竞争方法。可以在烧结材料中实现相变,从而达到所需的CTE值。

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