Infrared Analysis of Advanced Thin Film Materials

摘要

The technique of Fourier transform infrared (FTIR) reflectometry has been advanced to characterize the thickness and optical properties of thin films commonly used in advanced integrated circuits (I.C.s).This article describes the demonstration of a new,high accuracy reflectometer to characterize the reflectance of ultrathin gate oxides and chemically amplified deep ultraviolet (UV) photoresist thin films.