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首页> 外文期刊>Plasma physics reports >Creation of a hard microrelief on a titanium surface processed by microplasma discharges with a current amplitude of 200 A and pulse duration of 20 ms
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Creation of a hard microrelief on a titanium surface processed by microplasma discharges with a current amplitude of 200 A and pulse duration of 20 ms

机译:通过微等离子体放电在钛表面上形成坚硬的微浮雕,其电流幅度为200 A,脉冲持续时间为20 ms

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The interaction of microplasma discharges with samples made of VT1 commercial titanium was studied experimentally. The amplitude of the current pulses of microplasma discharges was 200 A, the pulse duration was 20 ms, and the number of current pulses was from 1 to 10. After microplasma processing, a 10-μm-thick solid remelted surface layer with an increased hardness formed on the titanium samples. As compared to the initial state of titanium samples, the surface layer hardened by microplasma discharges possesses improved parameters: the microhardness increases fivefold, the maximum admissible pressure applied to the samples during friction increases more than 20-fold, the friction wear rate is reduced by three orders of magnitude, and the friction coefficient decreases sixfold.
机译:实验研究了微等离子体放电与VT1商业钛制样品的相互作用。微等离子体放电的电流脉冲的幅度为200 A,脉冲持续时间为20 ms,电流脉冲的数量为1至10。经过微等离子体处理,厚度为10μm的固体重熔表面层具有较高的硬度在钛样品上形成。与钛样品的初始状态相比,通过微等离子体放电硬化的表面层具有改进的参数:显微硬度增加了五倍,摩擦期间施加到样品的最大允许压力增加了20倍以上,摩擦磨损率降低了三个数量级,摩擦系数降低六倍。

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