首页> 外文期刊>Plasma physics and controlled fusion >Formation of electron internal transport barriers by highly localized electron cyclotron resonance heating in the large helical device
【24h】

Formation of electron internal transport barriers by highly localized electron cyclotron resonance heating in the large helical device

机译:大型螺旋装置中高度局限的电子回旋共振加热形成电子内部传输势垒

获取原文
获取原文并翻译 | 示例
       

摘要

Internal transport barriers with respect to electron thermal transport (eITB) were observed in the large helical device, when the electron cyclotron resonance heating (ECH) power was highly localized on the centre of a plasma sustained by neutral beam injection. The eITB is characterized by a high central electron temperature of 6-8 keV with an extremely steep gradient, as high as 55 keV m(-1) and a low electron thermal diffusivity within a normalized average radius rho approximate to 0.3 as well as by the existence of clear thresholds for the ECH power and plasma collisionality. [References: 39]
机译:在大型螺旋装置中,当电子回旋共振加热(ECH)功率高度集中在中性束注入所维持的等离子体中心时,观察到了相对于电子热传输(eITB)的内部传输壁垒。 eITB的特点是中心电子温度为6-8 keV,斜率非常陡,高达55 keV m(-1),在归一化平均半径rho范围内的电子热扩散率低,大约为0.3,并且ECH功率和等离子体碰撞性存在明确的阈值。 [参考:39]

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号