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Thin ferroelectric films: Preparation and prospects of integration

机译:铁电薄膜:集成的制备和前景

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The properties of (Ba,Sr)TiO_3 and BiFeO_3 thin films and related nanostructures have been considered. The films have been prepared by rf sputtering in an oxygen atmosphere at an elevated pressure, and the nanostructures have been produced using focused ion-beam etching. The electric field has been applied across a planar interdigital structure of electrodes. The structure, dielectric, electro-optical, and nonlinear optical properties of the prepared samples have been investigated over wide ranges of thicknesses and electric field frequencies. The high efficiency of the planar switching and its influence on the optical properties of the produced structures have been demonstrated. The nanostructuring makes it possible to change the dielectric and optical properties of the materials under investigation, thus increasing the range of switching of functional parameters.
机译:已经考虑了(Ba,Sr)TiO_3和BiFeO_3薄膜的性能以及相关的纳米结构。通过在升高的氧气气氛中通过射频溅射来制备膜,并且已经使用聚焦离子束蚀刻来制备纳米结构。电场已经施加在电极的平面叉指结构上。已在较宽的厚度和电场频率范围内研究了所制备样品的结构,介电,电光和非线性光学性质。已经证明了平面开关的高效率及其对所产生的结构的光学性能的影响。纳米结构化可以改变所研究材料的介电和光学性能,从而增加了功能参数的转换范围。

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