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首页> 外文期刊>Physical Review, B. Condensed Matter >STRUCTURE AND PROPERTIES OF CLEAN AND IN-COVERED GE(103) SURFACES
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STRUCTURE AND PROPERTIES OF CLEAN AND IN-COVERED GE(103) SURFACES

机译:干净和覆盖的GE(103)表面的结构和性能

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Clean and In-covered Ge(103) surfaces have been studied using scanning tunneling microscopy, electron diffraction, and photoemission. At room temperature the clean surface displays a well ordered (4x1) reconstruction, which on heating to similar to 430 degrees C undergoes a reversible (4x1)<->(1x1) phase transition. Atomically resolved scanning tunneling microscopy images indicate that the (4x1) reconstruction involves two atomic layers. After depositing 2 ML of indium and annealing at 150 degrees C the (4x1) reconstruction is removed and a (1x1) structure forms which can be described as an In terminated ideal (103) surface with In atoms saturating all of the Ge surface dangling bonds. [References: 12]
机译:已使用扫描隧道显微镜,电子衍射和光发射研究了干净的In-In-Ge(103)表面。在室温下,清洁的表面显示出井井有条的(4x1)重构,在加热到430摄氏度时,该表面经历了可逆(4x1)-(1x1)相变。原子分辨扫描隧道显微镜图像表明(4x1)重建涉及两个原子层。沉积2毫升铟并在150摄氏度下退火后,将(4x1)重建结构移除,形成(1x1)结构,该结构可描述为具有In原子的In饱和理想(103)表面,其中In原子使所有Ge表面悬空键均饱和。 [参考:12]

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