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首页> 外文期刊>Physical Review, A. Atomic, molecular, and optical physics >Electron-capture processes of low-energy Si3+, Si4+, and Si5+ ions in collisions with helium atoms - art. no. 062701
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Electron-capture processes of low-energy Si3+, Si4+, and Si5+ ions in collisions with helium atoms - art. no. 062701

机译:低能Si3 +,Si4 +和Si5 +离子与氦原子碰撞时的电子捕获过程-艺术。没有。 062701

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摘要

Single- and double-electron-capture cross sections for Siq+ (g=3, 4, and 5) ions in collisions with He atoms have been measured at collision energies of a few hundred to a few thousand eV. The observed cross sections For single-electron capture are found to be of the order of 10(-15) cm(2), relatively independent of the collision energy, and are generally in agreement with recent quantal calculations for Si3+ and Si4+ ions and with the present Landau-Zener calculations for Si5+ ions. It is found that the measured cross sections for double-electron-capture processes, for which calculations are available only for Si4+ ions, are roughly one order of magnitude smaller than those for single-electron capture and tend to increase as the collision energy increases. [References: 24]
机译:与He原子碰撞时,Siq +(g = 3、4和5)离子的单电子和双电子俘获截面已在几百到几千eV的碰撞能量下进行了测量。发现单电子俘获的观察到的横截面约为10(-15)cm(2),相对独立于碰撞能量,并且通常与最近对Si3 +和Si4 +离子进行的定量计算以及Si5 +离子的当前Landau-Zener计算。已经发现,对于双电子俘获过程,所测量的横截面(仅适用于Si4 +离子)仅比单电子俘获的横截面小大约一个数量级,并且随着碰撞能量的增加而趋于增加。 [参考:24]

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