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首页> 外文期刊>Physical Review, A. Atomic, molecular, and optical physics >Stark-induced x-ray emission from high Rydberg states of H-like and He-like silicon ions - art. no. 032705
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Stark-induced x-ray emission from high Rydberg states of H-like and He-like silicon ions - art. no. 032705

机译:从高Rydberg态的类H和类He硅离子形成的斯塔克引起的X射线发射-艺术。没有。 032705

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摘要

Highly excited Rydberg states of H-like or He-like silicon are formed when Si14+ or Si13+ ions capture a single electron from an n=10 Rydberg target. Previous studies of the capture process indicate that a few n's near n=76 or n=72, respectively, are formed in the two cases. When these products are subjected to a weak external electric field (Eapproximate to20 V/cm), an enhanced rate of decay directly to the 1S ground state results as long-lived high-L states are mixed with the rapidly decaying P states. The yield of these nP-1S x rays approaches a limit when the external field is sufficient to fully Stark mix the Rydberg manifold and this limiting yield can be used to deduce the fraction of Rydberg ions which are formed in states of low m (m=-1,0,1). Measured values of this yield indicate a low-m fraction of about 40%. [References: 10]
机译:当Si14 +或Si13 +离子从n = 10的Rydberg标靶捕获单个电子时,会形成H型或He型硅的高激发Rydberg态。先前对捕获过程的研究表明,在两种情况下分别形成了接近n = 76或n = 72的几个n。当这些产品经受弱的外部电场(大约20 V / cm)时,由于长寿命的高L态与快速衰变的P态混合,直接导致1S基态的衰变速率提高。当外部电场足以完全斯塔克混合Rydberg流形时,这些nP-1S x射线的收率接近极限,该极限收率可用于推断在低m状态下形成的Rydberg离子的比例(m = -1,0,1)。该产率的测量值表明低-m分数约为40%。 [参考:10]

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