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Mass transfer characteristics of reciprocating screen stack electrochemical reactor in relation to heavy metal removal from dilute solutions

机译:往复式筛网堆电化学反应器的传质特性与从稀溶液中去除重金属的关系

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Rates of mass transfer were measured for copper deposition from dilute acidified copper sulphate solution on reciprocating arrays of separated and closely packed screens by the limiting current technique under different conditions of amplitude,frequency of oscillation and copper ion concentration.The mass transfer data for the diffusion controlled copper deposition at the limiting current from a solution of constant concentration were correlated by the equations:j_D = 0.732Re_v~(-0.35) for the closely packed screen array,and j_D=0.98Re_v~(-0.38) for the separated screen array.A mathematical model based on the surface renewal theory was found to agree fairly with the above equations.Study of the removal of copper by constant current electrolysis at the limiting current using an insoluble lead anode has shown that the reactor is capable of reducing copper ion concentration below the maximum permissible value in a time which depends on the operating conditions.The potential of using the present reactor for processing sparingly soluble reactants such as immiscible organic liquids,organic solids and gases which need to be dispersed prior to reacting at the electrode was highlighted.Also the possibility of using oscillating screen array as a catalytic reactor suitable for conducting liquid-solid diffusion controlled catalytic reactions such as removal of organic pollutants from industrial effluents by wet oxidation was noted.
机译:在不同的振幅,振荡频率和铜离子浓度的条件下,通过极限电流技术,测量了稀酸化硫酸铜稀溶液在分离和紧密堆积的筛子的往复阵列上的铜沉积的传质速率。扩散的传质数据恒定浓度溶液在极限电流下的受控铜沉积与以下方程式相关:对于紧密排列的筛阵列,j_D = 0.732Re_v〜(-0.35),对于分离筛阵列,j_D = 0.98Re_v〜(-0.38)发现基于表面更新理论的数学模型与上述方程式相当吻合。通过使用不溶性铅阳极在极限电流下通过恒定电流电解去除铜的研究表明,该反应器能够还原铜离子在一定时间内,浓度低于最大允许值,这取决于使用条件重点介绍了用于处理微溶性反应物的难处理反应器,例如在电极反应前需要分散的不混溶的有机液体,有机固体和气体。此外,还可以使用振荡筛阵列作为适合进行液-固扩散的催化反应器注意到受控的催化反应,例如通过湿式氧化去除工业废水中的有机污染物。

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