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International conference on characterization and metrology for ULSI technology

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1.Calibration Wafer for Temperature measurements in RTP Tools

机译：RTP工具中的温度测量校准晶片
- 作者：K.G.Kreider;D.P.Dewitt;B.K.Tsai;F.J.Lovas;D.W.Allen;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
2.Metrology Issues for Processing of 300 mm Wafers

机译：用于处理300毫米晶圆的计量问题
- 作者：Kenji Watanabe;Atsuyoshi Koike
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
3.Analytical Chalenges in Next Generation Packaging/Assembly

机译：下一代包装/装配中的分析挑战
- 作者：Rajen Dias;Deepak Goyal;Shalabh Tandon;Gay Smauelson;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
4.Characterization and Metrology Implication of the 1997 NTRS

机译：1997年的表征和计量含义含义
- 作者：W.Class;J.J.Wortman
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
5.Trend in Nondestructive Imaging of IC packages

机译：IC包装无损成像的趋势
- 作者：T.M.Moore;C.D.Hartfield;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
6.Gauging the Future: The Long Term Business Outlook for Metrology and Wafer Insjpection Equipment

机译：衡量未来：Metrology和晶圆Insjpection设备的长期业务前景
- 作者：David S.Perloff
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
7.Dimensional Metrology Challenges for ULSI Interconnects

机译：ULSI互连的尺寸计量挑战
- 作者：R.Havemann;H.Marchman;G.Dixit;M.Jain;E.Zielinski;A.Ralston;Y.Hsu;C.Jin;A.Singh;J.Schesinger;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
8.Metrology of 300mm Silicon Wafers: Challenges and Results

机译：300mm硅晶片的计量：挑战和结果
- 作者：P.Wagner
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
9.AN Analytical Framework for First-Order CMOS Device Design

机译：一阶CMOS设备设计的分析框架
- 作者：J.A.del Alamo;W.T.Lynch;D.A.Antoniadis
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
10.Modeling of Manufacturign Sensitivity and of Statistically Based process control Requirements for a 0.18 mum NMOS Device

机译：制造敏感性和0.18毫米NMOS装置的统计过程控制要求的建模
- 作者：P.M.Zeitzoff;A.F.Tasch;W.E.Moore;S.A.Khan;D.Angelo
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
11.Ultra-Shallow Junction Measuremtns: A Review of SIMS Approaches for ANnealed and processed Wafers

机译：超浅结测量：对退火和加工晶片的SIMS方法进行综述
- 作者：Gary R.Mount;Stephen P.Smith;Charles J.Hitzman;Victor K.F.Chia;Charles W.Magee;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
12.Industry/University/Gorvernment partnerships in Metrology: A New Paradigm for the Future

机译：工业/大学/政府在计量学中伙伴关系：未来的新范式
- 作者：C.R.Helms
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
13.Transimssion electron microscopy: A Critical Analytical tool for ULSI Technology

机译：Transimsion电子显微镜：ULSI技术的关键分析工具
- 作者：David Venables;David W.Susnitzky;A.John Mardinly;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
14.In-Line Characterization of Dooping Technologies for ULSI: Requirements and Capabilities

机译：ULSI的DOOPING技术的在线表征：要求和能力
- 作者：Larry Larson;Michael Current
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
15.Picosecond Ultrasonics: A New Approach for COntrol of Thin Metal processes

机译：PicoSecond超声波：一种控制薄金属工艺的新方法
- 作者：Robert J.Stoner;Christopher J.Morath;Guray Tas;George Antonelli;humphrey J.Maris;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
16.A Proposed holistic Approach to On-Chip, Off-Chip, Test, adn package Interconnections

机译：一种填充的片上，片外，测试，ADN封装互连
- 作者：Dirk J.Bartelink;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
17.Wet Chemical Analysis for the Semiconductor Industry A Total View

机译：半导体行业的湿化学分析总视图
- 作者：Marjorie K.Balazs;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
18.Inverse Modeling Applied to Scanning Capacitance Microscopy for Improved Spatial Resolution and Accuracy

机译：逆建模应用于扫描电容显微镜，以提高空间分辨率和准确性
- 作者：J.S.McMurray;C.C.Williams;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
19.Statistical metrology-measurement and Modeling of Variation for Advanced process Development and Design Rule Generation

机译：高级过程开发和设计规则生成的统计计量 - 测量和模拟变化
- 作者：Duane S.Boning;James E.Chung;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
20.Overlay metrology: The Systematic, the random and the ugly

机译：覆盖计量：系统，随机和丑陋
- 作者：neal Sullivan;jennifer Shin;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
21.An Overview of CD Metrology for Advanced CMOS process Development

机译：高级CMOS流程开发的CD计量概述
- 作者：Herschel Marchman;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
22.Thin Film Ellipsometry Metrology

机译：薄膜椭圆形测量计量
- 作者：Prabha Durgapal;James r.Ehrstein;Nhan V.Nguyen
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
23.Wafer Inspection Technology challenges for ULSI Manufacturing

机译：ULSI制造业的晶圆检测技术挑战
- 作者：Stan Stokowski;Mehdi Vaez-Iravani;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
24.Overview of Optical Microscopy and Optical Microspectroscopy

机译：光学显微镜概述和光学微型光谱
- 作者：Joel W.Ager;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
25.Metrology Aspects of SIMS Depth profiling for Advanced ULSI processes

机译：用于高级ULSI流程的SIMS深度分析的计量方面
- 作者：Andre Buderevich;Jerry Humter
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
26.Microscopy and Spectroscopy Characterization of Small Defects on 200 mm wafers

机译：显微镜和光谱表征200 mm晶片上的小缺陷
- 作者：C.R.Brundle;Yuri Uritsky;patrick Kinney;Walter Huber;Andrew Green;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
27.Advanced SEM imaging

机译：高级SEM成像
- 作者：D.C.Joy;D.E.Newbury;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
28.Metrology of Image placement

机译：图像放置的计量
- 作者：Alexander Starikov;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
29.One-and two-dimensional dopant/carrier profiling for ULSI

机译：Ulsi的一维掺杂剂/载体分析
- 作者：W.Vandervorst;T.Clarysse;P.De Wolf;T.Trenkler;T.hantschel;R.Stephenson;T.Janssens;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
30.Model-Based Silocon Wafer Criteria For Optimal integrated Circuit Performance

机译：基于模型的SiloCon晶片标准，用于最佳集成电路性能
- 作者：Howard R.Huff;Randal K.Goodall;W.Murray Bullis;James A.Moreland;Fritz G.Kirscht;Syd R.Wilson
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
31.Metology needs for the Semiconductor Industry VOer the Next Decade

机译：半导体行业在未来十年内的方法
- 作者：Alain C.Diebold
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
32.Intermittent-Contact Scannign Capacitance Microscopy Imaging and Modeling for Overlay metrology

机译：间歇接触扫描电容显微镜成像和覆盖计量的建模
- 作者：S.Mayo;J.J.Kopanski;W.F.Guthrie;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
33.Analysis of Molecular Adsorbaates on Si Surfaces with Thermal Desorption Spectrolcopy

机译：具有热解吸光谱晶体曲面的分子吸血管分析
- 作者：Norkuni yabumoto;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
34.Novel Analytical Technique for On-Line Monitoring of Trace Heavy Metals in Corrosive Chemicals

机译：腐蚀化学品痕量重金属在线监测的新型分析技术
- 作者：Stan Tsai;Samantha H.Tan;ANthony F.Flannery;Christopher W.Storment;Gregory T.A.Kovacs;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
35.Evaluation of Surface Depletion Effects in Single-Crystal Test Structures for Reference materials Applications

机译：用于参考材料应用的单晶试验结构中表面耗竭效应的评价
- 作者：Richard A.Allen;Rathindra N.Ghoshtagore;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
36.A Survey of Advanced Excimer Optical Imaging and Lithography

机译：高级准分子光学成像和光刻调查
- 作者：Koichi matsumoto;Kyoichi Suwa;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
37.Tip Characterization for Scanning Probe Microscope Width Metrology

机译：扫描探针显微镜宽度计量的尖端表征
- 作者：S.Dongmo;J.S.Villarrubia;S.N.Jones;T.B.Renegar;M.T.Postek;J.F.Song;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
38.Characterization of Ultra-Shallow Junctions with Tapered Groove Profilometry and Other techniques

机译：具有锥形槽轮廓测定法的超浅线和其他技术的特征
- 作者：S.Prussion;Christiaan A.Bil;Daniel F.Downey;M.L.Meloni;Carlton M.Osburn;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年
39.High-Resolution Microcalorimeter Energy-Dispersive Spectrometer for X-ray Microanalysis and Particle ANalysis

机译：用于X射线微量分析和颗粒分析的高分辨率微量仪能量分散谱仪
- 作者：D.A.Wollman;G.C.Hilton;K.D.Irwin;L.L.Dulcie;N.F.Bergren;John M.Martinis;American Institute of Physics
- 会议名称：《International conference on characterization and metrology for ULSI technology》 | 1998年