首页>外文会议>European conference on mask technology for integrated circuits and microcomponents

European conference on mask technology for integrated circuits and microcomponents

召开年：1998
召开地：Munich-Unterhaching(DE)
出版时间：-

会议文集：-

会议论文

热门论文

全部论文

全选（0）

1.Characterization of inspection sensitivity on advanced OPC reticles

机译：表征高级OPC标线的检查灵敏度
- 作者：Larry S. Zurbrick;KLA-Tencor Corp.;San Jose;CA;USA;Joseph A. Straub;DuPont Photomasks;Inc.;Santa Clara;CA;USA;Anthony Vacca;KLA-Tencor Corp.;Cedar Park;TX;USA.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
2.Determination of residual stress and elastic constants of silicon open stencil masks for ion projection lithography

机译：离子投影光刻用硅开口模板掩模的残余应力和弹性常数的确定
- 作者：A.Degen;Univ. Kassel;Kassel;Germany;Feng Shi;Univ. Kassel;Kassel;Germany;E.Sossna;Univ. Kassel;Kassel;Germany;R.Sunyk;Univ. Kassel;Kasssel;Germany;Joachim Voigt;Univ. Kassel;Berlin;Germany;Burkhard E. Volland;Univ. Kassel;Kassel;Germany;B.Reinker;Univ. Kassel;Kassel;Germany;Ivo W. Rangelow;Univ. Kassel;Kassel;Germany.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
3.Development of a new defect sensitivity monitor for advanced OPC reticle technology

机译：开发用于先进OPC掩模版技术的新型缺陷灵敏度监视器
- 作者：Wolfgang Staud;Applied Materials;Santa Clara;CA;USA;Yair Eran;Applied Materials;Yavne;Israel;Patrick Reynolds;Benchmark Technologies;Lynnfield;MA;USA;Craig B. Sager;Benchmark Technologies;Lynnfield;MA;USA.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
4.Development of an algorithm for monitoring pattern fidelity on photomasks for 0.2-um technology and beyond based on light optical CD metrology tools

机译：基于光学CD计量工具的0.2um及更高技术的光掩模图案保真度监控算法的开发
- 作者：Thomas Schaetz;Siemens AG;Munich;Germany;Bernd Hay;Siemens AG;Muenchen;Germany;Lars Walden;MueTec GmbH;Munich;Germany;Wolfram Ziegler;Siemens AG;Muenchen;Germany.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
5.Development of an inductively coupled plasma etching system for 230-mm reticles

机译：开发用于230毫米标线的感应耦合等离子体蚀刻系统
- 作者：David A. Klein;Plasma-Therm;Inc.;Palm Harbor;FL;USA;John Donohue;Plasma-Therm;Inc.;St. Petersburg;FL;USA.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
6.Effective multisite CD correlation to maximize high-end tool utilization

机译：有效的多站点CD相关性以最大限度地利用高端工具
- 作者：John W. Duff;Photronics;Inc.;Allen;TX;USA;John Allsop;Photronics;Inc.;Manchester;United Kingdom.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
7.Experience with EFQM assessment at Siemens Mask Shop

机译：在西门子口罩商店进行EFQM评估的经验
- 作者：Werner Reindl;Siemens AG;Munich;Germany;Siegfried Steuber;Siemens AG;Munich;Germany.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
8.Future reticle demand and next-generation lithography technologies

机译：未来的光罩需求和下一代光刻技术
- 作者：Uwe Behringer;Institute for Microstructure Technology/Forschungszen trum Karlsruhe GmbH;Karlsruhe;Germany;Christian Ehrlich;Leica Microsystems Lithography GmbH;Jena;Germany;Olaf Fortange;Leica Microsystems Lithography GmbH;ny;Germany.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
9.Geometrical E-beam proximity correction for raster scan systems

机译：光栅扫描系统的几何电子束接近校正
- 作者：Nikola Belic;aiss GmbH;Munich;Germany;Hans Eisenmann;aiss GmbH;Munich;Germany;Hans Hartmann;aiss GmbH;Munich;Germany;Thomas Waas;aiss GmbH;Munich;Germany.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
10.Hierarchical mask data preparation and special fracturing techniques in MGS

机译：MGS中的分层蒙版数据准备和特殊压裂技术
- 作者：B.Buerger;Fraunhofer Institut fuer Mikroelektronische Schaltung en und Systeme;Dresden;Germany;Uwe Baetz;Fraunhofer Institut fuer Mikroelektronische Schaltung en und Systeme;Dresden;Germany;Klaus-Dietmar Kunze;Fraunhofer Institut fuer Mikroelektronische Schaltung en und Systeme;Dresden;Germany;H.Wolf;Photronics MZD;Dresden;Germany.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
11.HOYA deep-UV EAPSM blanks development status

机译：HOYA Deep-UV EAPSM的开发现状空白
- 作者：Masao Ushida;HOYA Corp.;Yamanashi;Japan;Hideo Kobayashi;HOYA Corp.;Kitakoma-gun Yamanashi;Japan.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
12.Initial results from a Leica ZBA31H+ shaped E-beam mask writer located at the Photronics Advanced Mask Shop in Manchester England

机译：来自位于英国曼彻斯特的Photronics Advanced Mask Shop的Leica ZBA31H +型电子束口罩书写器的初步结果
- 作者：Stephen Johnson;Photronics;Ltd.;Manchester;United Kingdom;Paul Marshall;Photronics;Ltd.;Manchester;United Kingdom;Peter Osborne;Photronics;Ltd.;Manchester;United Kingdom;Hans J. Doering;Leica Microsystems Lithography GmbH;Jena;Germany;Christian Ehrlich;Leica Microsystems Lithography GmbH;Jena;Germany.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
13.Inspecting the new generation of reticles using UV imaging

机译：使用紫外线成像检查新一代光罩
- 作者：Mark Merrill;KLA-Tencor Corp.;San Jose;CA;USA;James N. Wiley;KLA-Tencor Corp.;Menlo Park;CA;USA;Benjamin G. Eynon;Jr.;DuPont Photomasks;Inc.;Austin;TX;USA.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
14.Investigation of lithography performance using multipass gray (MPG) with MEBES 5000

机译：使用MEBES 5000的多道灰度（MPG）研究光刻性能
- 作者：Robert L. Dean;Etec Systems;Inc.;Hayward;CA;USA;David Alexander;Etec Systems;Inc.;Hayward;CA;USA;Jan M. Chabala;Etec Systems;Inc.;Hayward;CA;USA;Tom Coleman;Etec Systems;Inc.;Meyreuil;France;Caryn Hartglass;Etec Systems;Inc.;Aix-en-Provence;France;Maiying Lu;Etec Systems;Inc.;Hayward;CA;USA;Charles A. Sauer;Etec Systems;Inc.;Hayward;CA;USA;Suzanne Weaver;Etec Systems;Inc.;Hayward;CA;USA.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
15.Ion projection lithography for IC manufacturing

机译：用于IC制造的离子投影光刻
- 作者：Albrecht Ehrmann;Siemens AG;Muenchen;Germany;Rainer Kaesmaier;Siemens AG;Munich;Germany;Hans Loeschner;Ion Microfabrications Systems;Wien;Austria.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
16.Manufacturing an advanced process characterization reticle incorporating halftone biasing

机译：制造结合了半色调偏置的先进工艺表征掩模版
- 作者：Kent H. Nakagawa;Photronics;Inc.;Sunnyvale;CA;USA;Douglas Van Den Broeke;Photronics;Inc.;Santa Clara;CA;USA;Jang Fung Chen;MicroUnity Systems Engineering;Inc.;Sunnyvale;CA;USA;Tom L. Laidig;MicroUnity Systems Engineering;Inc.;Sunnyvale;CA;USA;Kurt E. Wampler;MicroUnity Systems Engineering;Inc.;Sunnyvale;CA;USA;Roger F. Caldwell;MicroUnity Systems Engineering;Inc.;Sunnyvale;CA;USA.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
17.Overlay mapping of microlithographic pattern generators by means ofgrouped structures,

机译：微光刻图案发生器通过成组结构的叠加映射，
- 作者：Michael Arnz;Carl Zeiss;Oberkochen;Germany;Joachim Heppner;Carl Zeiss;Oberkochen;Germany;Werner Lessle;Carl Zeiss;Oberkochen;Germany.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
18.Overview of SCALPEL mask technology

机译：SCALPEL掩模技术概述
- 作者：Gregory R. Bogart;Lucent Technologies/Bell Labs.;Murray Hill;NJ;USA;Anthony E. Novembre;Lucent Technologies/Bell Labs.;Murray Hill;NJ;USA;Avi Kornblit;Lucent Technologies/Bell Labs.;Murray Hill;NJ;USA;Milton L. Peabody;Lucent Technologies/Bell Labs.;Murray Hill;NJ;USA;Reginald C. Farrow;Lucent Technologies/Bell Labs.;Murray Hill;NJ;USA;Myrtle I. Blakey;Lucent Technologies/Bell Labs.;Murray Hill;NJ;USA;Rich J. Kasica;Lucent Technologies/Bell Labs.;Murray Hill;NJ;USA;James A. Liddle;Lucent Technologies/Bell Labs.;Scotch Plains;NJ;USA;Thomas E. Saunders;Lucent Technologies/Bell Labs.;Palm City;FL;USA;Chester S. Knurek;Lucent Technologies/Bell Labs.;Murray Hill;NJ;USA.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
19.Pattern placement metrology tool matching within DPI's sites

机译：DPI站点内的图案放置计量工具匹配
- 作者：Norbert Talene;DuPont Photomasks SA;Rousset Cedex;France;Klaus-Dieter Roeth;Leica Microsystems Wetzlar GmbH;Wetzlar;Germany.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
20.Pellicle-induced reticle distortion: an experimental investigation

机译：膜片引起的光罩变形：实验研究
- 作者：Wen Chen;DuPont Photomasks;Inc.;Kokomo;IN;USA;James A. Carroll;DuPont Photomasks;Inc.;Danbury;CT;USA;Glenn Storm;DuPont Photomasks;Inc.;Danbury;CT;USA;Ronald G. Ivancich;DuPont Photomasks;Inc.;Santa Clara;CA;USA;John Maloney;DuPont Photomasks;Inc.;Santa Clara;CA;USA;Olivier Maurin;DuPont Photomasks SA;Rousset Cedex;France;Eric Souleillet;DuPont Photomasks SA;Rousset Cedex;France.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
21.Results from submicron CD metrology obtained with new I-line tools

机译：使用新的I-line工具从亚微米CD计量获得的结果
- 作者：Hans-Juergen Brueck;MueTec GmbH;Munich;Germany;Sebastian Birkenmayer;MueTec GmbH;Munich;Germany;Guenther Falk;MueTec GmbH;Munich;Germany;Gerd Scheuring;MueTec GmbH;Munich;Germany;Lars Walden;MueTec GmbH;Munich;Germany;Sigrid Lehnigk;Submicron Technologies GmbH;Munich;Germany.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
22.Use of KLA-Tencor STARlight SL 300 for in-process contamination inspection to control reticle defect densities

机译：使用KLA-Tencor STARlight SL 300进行过程中的污染检查以控制标线缺陷密度
- 作者：Duane Dutton;Hewlett-Packard Co.;Santa Clara;CA;USA;Wayne P. Shen;Hewlett-Packard Co.;Santa Clara;CA;USA;Richard Yee;Hewlett-Packard Co.;Palo Alto;CA;USA;James A. Reynolds;Reynolds Consulting;Sunnyvale;CA;USA.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
23.PN and SOI wafer flow process for stencil mask fabrication

机译：用于模板掩模制造的PN和SOI晶片流工艺
- 作者：Author(s): Joerg Butschke Institut fuer Mikroelektronik/Stuttgart Stuttgart Germany;Albrecht Ehrmann Siemens AG Muenchen Germany;E.Haugeneder Ionen Mikrofabrikations Systeme GmbH Wien Austria;Mathias Irmscher Institut fuer Mikroelektronik/Stuttgart Stuttgart Germany;Rainer Kaesmaier Siemens AG Munich Germany;Karl Kragler Siemens AG Erlangen Germany;Florian Letzkus Institut fuer Mikroelektronik/Stuttgart Stuttgart Germany;Hans Loeschner Ionen Mikrofabrikations Systeme GmbH Wien Austria;J.Mathuni Siemans AG Muenchen Germany;Ivo W. Rangelow Univ. Kassel Kassel Germany;Carsten Reuter Institut fuer Mikroelektronik/Stuttgart Hannover Germany;Feng Shi Univ. Kassel Kassel Germany;Reinhard Springer Institut fuer Mikroelektronik/Stuttgart Stuttgart Germany.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
24.Mask technology for EUV lithography

机译：EUV光刻的掩模技术
- 作者：Author(s): M.Bujak Lawrence Livermore National Lab. Livermore CA USA;Scott C. Burkhart Lawrence Livermore National Lab. Livermore CA USA;Charles J. Cerjan Lawrence Livermore National Lab. Livermore CA USA;Patrick A. Kearney Lawrence Livermore National Lab. Livermore CA USA;Craig E. Moore Lawrence Livermore National Lab. Livermore CA USA;Shon Prisbrey Lawrence Livermore National Lab. Livermore CA USA;Donald W. Sweeney Lawrence Livermore National Lab. Livermore CA USA;William M. Tong Lawrence Livermore National Lab. Livermore CA USA;Stephen P. Vernon Lawrence Livermore National Lab. Livermore CA USA;Christopher C. Walton Lawrence Livermore National Lab. Livermore CA USA;Abbie L. Warrick Lawrence Livermore National Lab. Livermore CA USA;Frank J. Weber Lawrence Livermore National Lab. Livermore CA USA;Marco Wedowski Lawrence Livermore National Lab. Livermore CA USA;Karl C. Wilhelmsen Lawrence Livermore National Lab. Livermore CA USA;J.Bokor Lawrence Berkeley National Lab. CA USA;Sungho Jeong Lawrence Berkeley National Lab. Berkeley CA USA;Gregory F. Cardinale Sandia National Labs. Livermore CA USA;Avijit K. Ray-Chaudhuri Sandia National Labs. Livermore CA USA;Alan R. Stivers Intel Corp. San Jose CA USA;E.Tenjil Intel Corp. USA;Pei-yang Yan Intel Corp. Santa Clara CA USA;Scott D. Hector Motorola Oakland CA USA;Khanh B. Nguyen Advanced Micro Devices Inc. Sunnyvale CA USA.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
25.Overlay mapping of microlithographic pattern generators by means of grouped structures

机译：借助分组结构对微光刻图案生成器进行覆盖映射
- 作者：Author(s): Michael Arnz Carl Zeiss Oberkochen Germany;Joachim Heppner Carl Zeiss Oberkochen Germany;Werner Lessle Carl Zeiss Oberkochen Germany.
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 1999年
26.Mask Technologies for Deep X-ray LIGA

机译：深度X射线LIGA的掩模技术
- 作者：Laurence Singleton;Peter Detemple;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- LIGA;
- deep X-ray lithography;
- DXRL;
- PMMA;
- optical components;
- waveguides;
- moulding;
27.Mask CD characterization with EUV reflectometry at the electron storage ring BESSY Ⅱ

机译：电子储存环BESSYⅡ的EUV反射仪掩模CD表征Ⅱ
- 作者：Albrecht Ehrmann;Jenspeter Rau;Andreas Wolter;Frank-Michael Karnm;Josef Mathuni Frank Scholze;Johannes Tuemmler;Gerhard Ulml;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
28.Electron Beam Mask Repair with induced Reactions

机译：电子束掩模修复诱导反应
- 作者：Hans W.P. Koops;Klaus Edinger;Johannes Bihr;Volker Boegli;Jens Greiser;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
29.New methods for CD measurements on photomasks using dark field optical microscopy

机译：使用暗场光学显微镜的光掩模CD测量的新方法
- 作者：Bernd Bodermannauthor_name/;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
30.Extending TeraStar Reticle Inspection Capability to the 90nm Node Through Layer Specific Algorithms

机译：通过层特定算法将Terastar掩模版检查能力扩展到90nm节点
- 作者：Maciej Rudzinski;Hector Garcia;William Volk;Lantian Wang;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- alternating phase shift masks;
- defect inspection;
- reticle;
- contact;
- via;
31.Optical Emission Endpoint Optimization in the Tetra Etch Chamber for Production of Embedded Phase Shift Photomasks

机译：用于生产嵌入相移光掩模的Tetra蚀刻室中的光发射端点优化
- 作者：Cynthia B. Brooks;Scott Anderson;Rex Anderson;Corey Collard;Jason Clevenger;Nicole Sandlin;Melisa J. Buie;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- MoSiON etch;
- tetra;
- photomask etch;
- PSM;
- endpoint;
- optical emission spectroscopy;
- chrome etch;
32.Method to determine a detection capability of the die-to-database mask inspection system in regard to pinhole and pindot defects

机译：确定钻孔掩模检查系统关于针孔和界面缺陷的检测能力的方法
- 作者：Syarhey M. Avakawauthor_name/;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- inspection;
- reticles;
- detection probability;
33.Performance of the Aerial Image Measurement System for 157 nm Lithography

机译：用于157 nm光刻的空中图像测量系统的性能
- 作者：Peter Kuschnerus;Thomas Engel;Wolfgang Harnisch;Claudia Hertfelder;Axel Zibold;Jan-Peter Urbach;Christof M. Schilz;Klaus Eisner;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- AIMS;
- 157 nm lithography;
- photo masks;
- process window;
34.Compensation of Long-Range Process Effects on Photomasks by Design Data Correction

机译：通过设计数据校正来补偿对光掩模的远程过程效应
- 作者：Martin Bloecker;Gerd Ballhorn;Jens Schneider;Nikola Belie;Hans Eisenmann;Danny Keogan;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- mask process correction;
- dry etch loading;
- pattern density;
- CATS;
35.Early Mask Making During the 1960's in Dresden

机译：早期面具制作在1960年代的德累斯顿
- 作者：Hans W. Beckerauthor_name/;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
36.Simulation study of pattern printability for reflective mask in EUV lithography

机译：EUV光刻反光面膜模式可印刷性模拟研究
- 作者：Minoru Sugawara;Akira Chiba;Iwao Nishiyama;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- optical proximity correction;
- attenuated phase shift mask;
- alternating phase shift mask;
37.Integration of OPC and Mask Data Preparation

机译：OPC和掩码数据准备的集成
- 作者：Steffen Schulze;Pat LaCour;Norma Rodriguez;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
38.Fully automated CD-Metrology and Mask Inspection in a Mask Production Environment using the MueTec DUV Tool

机译：使用MUETEC DUV工具在掩模生产环境中完全自动化的CD-Metrology和面罩检查
- 作者：Gerd Scheuring;Alexander Petrashenko;Stefan Dobereiner;Frank Hillmann;Hans-Jurgen Bruck;Andrew C. Hourd;Anthony Grimshaw;Gordon Hughes;Shiuh-Bin Chen;Parkson Chen
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
39.Implementation of 248nm based CD Metrology for Advanced Reticle Production

机译：基于248nm的CD Metrology实现高级掩盖生产
- 作者：Andrew C. Hourd;Anthony Grimshaw;Gerd Scheming;Christian Gittinger;Stefan Doebereiner;Frank Hillmann;Hans-Juergen Brueck;Hans Hartmann;Volodymyr Ordynskyy;Kai Peter;Shiuh-Bin Chen;Parkson Chen;Rik Jonckheere;Vicky Philipsen;Thomas Schaetz;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- CD metrology;
- DUV imaging;
- 90nm node;
- 193nm;
40.Accuracy vs. Complexity: OPC Solutions andTradeoffs

机译：准确性与复杂性：OPC解决方案Andtradeoffs
- 作者：Artur Balasinski;Walter Iandolo;Bartosz Banachowicz;Wolf Staud;Melody Ma;Jason Sweis;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
41.Fully automated CD - Metrology and Mask Inspection in a Mask Production Environment using the MueTec DUV Tool

机译：使用MUETEC DUV工具在掩模生产环境中全自动CD - 计量和面罩检查
- 作者：Gerd Scheming;Alexander Petrashenko;Stefan Doebereiner;Frank Hillmann;Hans-Juergen Brueck;Andrew C. Hourd;Anthony Grimshaw;Gordon Hughes;Shiuh-Bin Chen;Parkson Chen;Thomas Schaetz;Thomas Struck;Paul van Adrichem;Herman Boerland;Sigrid Lehni;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
42.Investigation of reticle defect formation at DUV lithography

机译：Duv光刻掩模缺陷形成的调查
- 作者：Kaustuve Bhattacharyya;William Volk;Brian Grenon;Darius Brown;Javier Ayala;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- DUV;
- PSM;
- mask contamination;
- mask;
- crystal-growth;
- cyanuric acid;
- pellicle;
- 193nm;
- scanner;
- STARlight;
43.Yield Mask (The FIrst Professional Yield Management Tool Specifically Developed for a Mask House)

机译：产量掩模（专门为面具房屋开发的第一个专业产量管理工具）
- 作者：Rudolf Laubmeier;Annemarie MacKenzie;Gerd Stockmann;Sana Shaik;Steve White
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
44.Feature Proximity Errors on Mask: Assessment Results of Commercially Obtained Reticles'

机译：掩码上的特征差异错误：商业上获得的术语评估结果'
- 作者：Rik Jonckheere;Goedele Potoms;Vicky Philipsen;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- 4X reticles;
- CD metrology;
- 2D quality;
- proximity effects;
- 193nm lithography;
45.Yield Mask: First Professional Yield Management Tool Specifically Developed for a Mask House

机译：产量面具：专门为面具房屋开发的第一个专业产量管理工具
- 作者：Rudolf Laubmeier;Annemarie MacKenzie;Gerd Stockmann;Sana Shaik;Steve White;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
46.Integration of OPC and Mask Preparation

机译：整合OPC和面膜准备
- 作者：Steffen Schulze;Pat LaCour;Norma Rodriguez
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
47.Contact hole litho correlation with shape analysis'

机译：与形状分析的接触孔Litho相关性'
- 作者：Maurice Janssen;Khalid Elbattay;Cars ten Kohler;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- contact hole shape simulation;
- attenuated PSM;
- reticle SEM measurement;
48.A System to Improve the Understanding of Collected Logistic Data, to Optimise Cycle-Time and Delivery Performance

机译：一种提高收集物流数据的理解的系统，优化循环时间和交付性能
- 作者：Wim-Jan van Rooijen;Ben Rodriguez;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- mask house;
- bottleneck management;
- cycle time;
- flow-factor;
- MES;
49.A Printability Study for Phase-Shift Masks at 193nm Lithography

机译：193nm光刻的相移掩模的可印刷性研究
- 作者：Vicky Philipsen;Rik Jonckheere;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- defect printability;
- mask 2D quality;
- 193nm lithography;
- attenuated phase-shift mask;
50.Through-Pellicle Capable, DUV-based CD Metrology on Reticles for Wafer Fab and RD Environment

机译：通过薄膜能力，基于DUV的CD计量晶片FAB和研发环境的晶粒
- 作者：Rik Jonckheere;Vicky Philipsen;Gerd Scheuring;Frank Hillmann;Hans-Juergen Brueck;Volodymyr Ordynskyy;Kai Peter;Andrew Hourd;Thomas Schaetz;Shiuh-Bin Chen;Parkson Chen;Karl Sommer;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- 4X reticles;
- optical CD metrology;
- 2D quality;
- linearity;
- 193nm lithography;
51.Development and characterization of new CD mask standards: a status report'

机译：新CD掩模标准的开发和特征：状态报告'
- 作者：Thomas Schaetz;Bertram Hauffe;Stefan Doebereiner;Hans-Juergen Brueck;Bernd Brendel;Lutz Bettin;Klaus-Dieter Roeth;Walter Steinberg;Peter Speckbacher;Wolfgang Sedlmeier;Thomas Engel;Wolfgang Haessler-Grohne;Werner Mirande;Harald Bosse;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
52.Use of Nanomachining for 100 Nanometer Mask Repair

机译：使用纳米机械加工100纳米掩模修复
- 作者：Bob LoBianco;Roy White;Ted Nawrocki;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
53.Application of Chromeless Phase Lithography (CPL) masks in ArF lithography

机译：在ARF光刻中的无晶态光刻（CPL）掩模的应用
- 作者：Bryan S. Kasprowicz;Christopher J. Progler;Wei Wu;Will Conley;Lloyd C. Litt;Doug Van Den Broeke;Kurt E. Wampler;Robert Socha;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- PSM manufacturing;
- chromeless phase lithography;
- CPL;
- PSM;
- high transmission attenuated PSM;
- chromeless mask;
54.A Mask Industry Assessment: 2002

机译：面具行业评估：2002年
- 作者：Kurt R. Kimmelauthor_name/;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- mask industry;
- photomask;
- industry;
- mask yield;
- photomask yield;
- mask quality;
- photomask quality;
55.Ultra-Thin Membrane EPL Masks

机译：超薄膜EPL面罩
- 作者：J. Greschner;T. Bayer;S. Kalt;H. Weiss;P. L. Reu;R. L. Engelstad;O. R. Wood II;C. Thiel;M. Gordon;R. Dhaliwal
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
56.A Mask Industry Assessment: 2002

机译：面具行业评估：2002年
- 作者：Kurt R. Kimmel
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- mask industry;
- photomask;
- industry;
- mask yield;
- photomask yield;
- mask quality;
- photomask quality;
57.Selete Activity of 157nm Lithography and Masks

机译：删除157 nm光刻和面具的活动
- 作者：Nobuyuki Yoshioka;Toshiro Itani;Wataru Wakamiya;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
58.The compact excimer laser - light source for optical (mask) inspection systems

机译：用于光学（掩模）检查系统的紧凑型准分子激光源
- 作者：Tobias Pflanz;Heinz Huber;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
59.Through the looking glass: What is on the horizon for the Mask Maker?

机译：通过看玻璃：面具制造商的地平线是什么？
- 作者：R. S. Mackay;B. G. Eynon;D. P. Mathur;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
60.Inspecting Alternating Phase Shift Masks by Matching Stepper Conditions

机译：通过匹配步进条件检查交替相移掩模
- 作者：Shirley Hemar;Anja Rosenbusch;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
- aerial-image based mask inspection;
- AAPSM;
- OPC;
- 193nm technology;
- at-wavelength inspection;
61.Inspection of alternating phase shift masks through the use of phase contrast techniques

机译：通过使用相位对比度技术检查交替相移掩模
- 作者：Larry Zurbrick;Maciej Rudzinski;Stan Stokowski;Long He;Kurt Kimmel;Nishrin Kashwala;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年
62.Integration of Mask RD and Mask Manufacturing to support the European Semiconductor Industry

机译：面膜研发和面罩制造的整合支持欧洲半导体行业
- 作者：Markus Dilgerauthor_name/;SPIE-The International Society for Optical Engineering
- 会议名称：《European conference on mask technology for integrated circuits and microcomponents》 | 2003年