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Surface modification of TiO_2 by a ruthenium(Ⅱ) polypyridyl complex via silyl-linkage for the sensitized photocatalytic degradation of carbon tetrachloride by visible irradiation

机译:钌(Ⅱ)多吡啶基配合物通过甲硅烷基键对TiO_2进行表面改性,用于可见光敏化光催化降解四氯化碳

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摘要

A new ruthenium(Ⅱ) photosensitizer, [Ru~Ⅱ(py-pzH)_3]~(2+) (where py-pzH = 3-(2′-pyridyl)pyrazole), has been synthesized. The complex displayed outstanding excited state redox properties (estimated Ru~Ⅲ/Ru~(Ⅱ*)≈-1.24V vs. NHE) and was expected to sensitize the injection of electrons into the conduction band of anatase TiO_2 upon visible irradiation. The photosensitizer was anchored onto the surface of anatase TiO_2 particles via in situ silylation. The silyl-linkage displayed excellent stability in both aqueous media, over a wide pH range, and in common organic solvents. The resultant material, TiO_2-[Ru~Ⅱ(py-pz-Si≡)_3], was found to be able to mediate degradation of CCl_4 in neutral aqueous medium under broad band visible irradiation (λ > 450 nm). The relation between the rate of degradation and concentration of substrate was explored and the mechanism of the photodegradation of the perhalogenated organic was discussed.
机译:合成了一种新型钌(Ⅱ)光敏剂[Ru〜Ⅱ(py-pzH)_3]〜(2 +)(其中py-pzH = 3-(2'-吡啶基)吡唑)。该配合物表现出杰出的激发态氧化还原性质(相对于NHE,估计Ru〜Ⅲ/ Ru〜(Ⅱ*)≈-1.24V),并有望在可见光照射下敏化锐钛矿TiO_2导带中的电子注入。通过原位甲硅烷基化将光敏剂固定在锐钛矿型TiO_2颗粒的表面。甲硅烷基键在广泛的pH范围内的两种水性介质中和普通有机溶剂中均具有出色的稳定性。发现所得材料TiO_2- [Ru〜Ⅱ(py-pz-Si≡)_3]能够在宽带可见光照射下(λ> 450 nm)介导CCl_4在中性水性介质中的降解。探讨了降解速率与底物浓度之间的关系,并探讨了全卤代有机物的光降解机理。

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