...
首页> 外文期刊>Thin Solid Films >Annealing induced structural evolution and electrochromic properties of nanostructured tungsten oxide films
【24h】

Annealing induced structural evolution and electrochromic properties of nanostructured tungsten oxide films

机译:退火诱导纳米氧化钨薄膜的结构演化和电致变色性能

获取原文
获取原文并翻译 | 示例
           

摘要

The effect of microstructure on the optical and electrochemical properties of nanostructured tungsten oxide films was evaluated as a function of annealing temperature. The films using block copolymer as the template were prepared from peroxotungstic acid (PTA) by spin-coating onto the substrate and post-annealed at 250-400 ℃ to form tungsten oxide films with nanostructure. The microstructure of the films was measured by X-ray diffraction and surface electron microscopy. The films annealed at temperatures below 300 ℃ are characterized by amorphous or nanocrystalline structures with a pore size of less than 10 nm. The evaluated annealing temperature caused a triclinic crystalline structure and microcracks. Cyclic voltammetry measurements were performed in a LiClO_4-propylene carbonate electrolyte. The results showed that the ion inserted capacity were maximized for films annealed at 300 ℃ and decreased with the increasing of annealing temperature. The electrochromic properties of the nanostructured tungsten oxide films were evaluated simultaneously by potentiostat and UV-vis spectroscopy. The films annealed at 300 ℃ exhibit high transmission modulation (ΔT ~ 40%) at λ = 633 nm and good kinetic properties. As a result, the correlation between the microstructure and kinetic properties was established, and the electrochromic properties have been demonstrated.
机译:评估了微结构对纳米结构氧化钨薄膜光学和电化学性能的影响,该温度是退火温度的函数。以过氧钨酸(PTA)为基体,通过旋涂法制备了以嵌段共聚物为模板的薄膜,并在250-400℃下进行了后退火,形成了具有纳米结构的氧化钨薄膜。通过X射线衍射和表面电子显微镜测量膜的微观结构。在低于300℃的温度下退火的薄膜的特征是孔径小于10 nm的非晶或纳米晶体结构。评估的退火温度导致三斜晶体结构和微裂纹。循环伏安法测量是在LiClO_4-碳酸亚丙酯电解质中进行的。结果表明,在300℃退火的薄膜中,离子插入容量最大,随退火温度的升高而降低。纳米结构的氧化钨膜的电致变色性能通过恒电位仪和紫外可见光谱仪同时进行评估。在300℃退火的薄膜在λ= 633 nm处具有较高的透射调制(ΔT〜40%)和良好的动力学性能。结果,建立了微观结构和动力学性质之间的相关性,并且已经证明了电致变色性质。

著录项

  • 来源
    《Thin Solid Films》 |2013年第31期|258-262|共5页
  • 作者单位

    Department of Materials Science and Engineering, National Cheng Kung University, Tainan 701, Taiwan, ROC;

    School of Dental Technology, Taipei Medical University, Taipei City 110, Taiwan, ROC;

    Department of Materials Science and Engineering, National Cheng Kung University, Tainan 701, Taiwan, ROC;

    Department of Mechanical Engineering, Southern Taiwan University, Tainan 710, Taiwan, ROC;

    Department of Materials Science and Engineering, National Cheng Kung University, Tainan 701, Taiwan, ROC,Department of Chemical and Materials Engineering, National University of Kaohsiung, Kaohsiung 81148, Taiwan, ROC,Research Center for Energy Technology and Strategy, National Cheng Kung University, Tainan 701, Taiwan, ROC;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Electrochromism; Tungsten oxide films; Sol-gel method; Nanostructured; Post annealing;

    机译:电致变色;氧化钨薄膜;溶胶-凝胶法纳米结构;后退火;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号