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Photoelectrochemical properties of WO_3 nanoparticulate thin films prepared by carboxylic acid-assisted electrodeposition

机译:羧酸辅助电沉积制备WO_3纳米颗粒薄膜的光电化学性能

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摘要

Optimisation of particle sizes of WO_3 films is important for photoelectrochemical applications. However, most of the developed size-controlled synthesis techniques involve complicated instruments or vacuum systems. The present work presents an alternative method using carboxylic acid-assisted electrodeposition where WO_3 thin films were deposited from peroxotungstic acid (PTA) solution containing different carboxylic acids (formic oxalic, citric). The effects of carboxylic acids on the electrodeposition and the resultant morphological, mineralogical, optical, and photoelectrochemical properties of the WO_3 films were investigated. The analysis showed that the films consisted of equiaxed nanoparticulate monoclinic WO_3. The deposition thicknesses and the average grain (individual particle and agglomerate) sizes of the films were dependent on the amount of hydronium ions and the molecular weight and associated sizes of the conjugate bases released upon the dissociation of carboxylic acids in the PTA solutions, which result in hydrogen bond formation and molecular dispersion. The photocurrent densities of the films deposited with carboxylic acids were greater than that of the film deposited from pure PTA. These differences were attributed to improvements in (1) grain size, which controls photogenerated electron-hole transport, and (2) effective grain boundary area, which controls the numbers of active reaction sites and electron-hole recombination sites.
机译:WO_3薄膜粒径的优化对于光电化学应用很重要。但是,大多数已开发的尺寸控制合成技术都涉及复杂的仪器或真空系统。本工作提出了一种使用羧酸辅助电沉积的替代方法,其中WO_3薄膜是从含有不同羧酸(甲酸,草酸,柠檬酸)的过氧钨酸(PTA)溶液中沉积的。研究了羧酸对电沉积以及WO_3薄膜的形貌,矿物学,光学和光电化学性质的影响。分析表明该膜由等轴纳米颗粒单斜晶WO_3组成。薄膜的沉积厚度和平均晶粒(单个颗粒和团聚体)尺寸取决于水合氢离子的量以及在PTA溶液中羧酸解离后释放的共轭碱的分子量和相关尺寸。在氢键形成和分子分散中。用羧酸沉积的薄膜的光电流密度大于用纯PTA沉积的薄膜的光电流密度。这些差异归因于(1)控制光生电子空穴传输的晶粒尺寸和(2)控制活性反应位点和电子-空穴复合位点数量的有效晶界面积的改善。

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  • 来源
    《Thin Solid Films》 |2013年第1期|191-196|共6页
  • 作者单位

    School of Materials Science and Engineering, University of New South Wales, Sydney, NSW 2052, Australia;

    School of Materials Science and Engineering, University of New South Wales, Sydney, NSW 2052, Australia,Department of Industrial Engineering, Faculty of Engineering, Naresuan University, Phitsanulok 65000, Thailand;

    School of Materials Science and Engineering, University of New South Wales, Sydney, NSW 2052, Australia;

    School of Materials Science and Engineering, University of New South Wales, Sydney, NSW 2052, Australia;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    WO_3 thin films; Electrodeposition; PTA; Photocurrent; Carboxylic acids;

    机译:WO_3薄膜;电沉积;PTA;光电流羧酸;

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