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Electronic charge distribution at interfaces between Cu-phthalocyanine films and semiconductor surfaces

机译:铜酞菁薄膜与半导体表面之间的界面处的电荷分布

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摘要

Total current electron spectroscopy (TCS) that uses a probing beam of low energy electrons was applied to study electronic charge transfer at interfaces between Cu-phthalocyanine (CuPc) films thermally deposited in situ onto ZnO, oxidized and crystalline silicon substrates. Analysis of the TCS data provided us also with new data on the density of unoccupied electron states (DOUS) of the CuPc films at 0―25 eV above E_F. A most significant electronic charge transfer from the CuPc film to SiO_2-Si and n-Si(l 00) was observed and the polarization layer extended up to 10 nm into the CuPc film bulk. The electronic structure of the CuPc molecules on n-Si(l 00) and on ZnO(000 1) was perturbed within 1―2 nm of the deposit due to interaction with the substrates. Admission of O_2 and NO_2 at 10~(-5) Pa and 300 K resulted in a reversible decrease and increase of the film surface potential, respectively. Formation of TC peaks related to O-orbitals on the gas adsorption on the CuPc surface was also registered.
机译:使用低能电子探测束的总电流电子光谱法(TCS)研究了在原位热沉积到ZnO,氧化的和结晶的硅基板上的Cu-酞菁(CuPc)薄膜之间的界面处的电荷转移。 TCS数据的分析也为我们提供了有关E_F上方0〜25 eV处CuPc薄膜的未占据电子态(DOUS)密度的新数据。观察到从CuPc膜到SiO_2 / n-Si和n-Si(100)的最重要的电荷转移,并且偏振层延伸到CuPc膜体中直至10 nm。由于与基板的相互作用,n-Si(l 00)和ZnO(000 1)上的CuPc分子的电子结构在沉积的1-2 nm之内受到干扰。 O_2和NO_2在10〜(-5)Pa和300 K下的进入分别导致薄膜表面电位的可逆降低和增加。在CuPc表面上的气体吸附上也记录了与O轨道有关的TC峰的形成。

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