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An option for the surface science on Cu chalcopyrites: the selenium capping and decapping process

机译:铜黄铜矿表面科学的一种选择:硒的去盖和去盖过程

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摘要

A selenium capping and decapping process for the protection of CuInSe_2 surfaces during storage in air was investigated. The quality and cleanness of CuInSe_2(001) surfaces restored in UHV by thermal evaporation of the covering protective Se cap was assessed. For the study, MBE-grown heteroepitaxial CuInSe2/GaAs(001) films were employed. The Se capping and decapping process was monitored by reflection high-energy electron diffraction. The Se cap layer is amorphous and, after its reevaporation, the initial diffraction pattern of CuInSe_2(001) is restored. The decapping process and the quality of decapped CuInSe_2(001) surfaces were investigated by means of photoelectron spectroscopy using synchrotron radiation with excitation energies of 1050 and 95 eV. For a decapping temperature of 390℃, an O 1s contamination signal as small as the detection limit was found. Photoelectron spectra taken with the highest surface-sensitivity (hv = 95 eV) yield well-resolved valence band emissions confirming the low contamination level and high quality of the decapped surfaces. The investigations show that the Se capping and decapping process is an efficient means for the conservation and restoration of clean and well-defined Cu chalcopyrite surfaces in UHV.
机译:研究了硒封盖和脱盖工艺,用于在空气中存储过程中保护CuInSe_2表面。评估了通过覆盖保护性Se盖的热蒸发而在特高压中恢复的CuInSe_2(001)表面的质量和清洁度。为了进行研究,采用了MBE生长的异质外延CuInSe2 / GaAs(001)薄膜。通过反射高能电子衍射监测Se的封端和脱盖过程。 Se盖层是非晶的,并且在其再次蒸发之后,恢复了CuInSe_2(001)的初始衍射图案。利用光电子能谱研究了同步激发辐射为1050和95 eV的去盖铜的CuInSe_2(001)表面的去盖过程和质量。在开盖温度为390℃时,发现的O 1s污染信号小至检测极限。以最高的表面灵敏度(hv = 95 eV)拍摄的光电子谱产生了良好解析的价带发射,证实了低污染水平和脱盖表面的高质量。研究表明,Se的封盖和去盖过程是一种用于保护和恢复特高压中干净且轮廓分明的铜黄铜矿表面的有效方法。

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