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Diamond surface modification following thermal etching of Si supported hydrogenated diamond films by DBr

机译:用DBr热蚀刻硅负载的氢化金刚石膜后的金刚石表面改性

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In this work, we study the modification of hydrogenated diamond films deposited on silicon resulting from its exposure to DBr followed by an annealing above 600 K, using high resolution electron energy loss spectroscopy (HREELS). This procedure results in silicon carbide SiC formation within the diamond film, as evidenced by the observation of a loss peak at 117 meV and its first harmonic at 233 meV in HREEL spectra. This diamond surface modification is interpreted as resulting from the reaction of products of the silicon support thermally activated etching with hydrogenated diamond. (c) 2005 Elsevier B.V. All rights reserved.
机译:在这项工作中,我们使用高分辨率电子能量损失谱(HREELS)研究了暴露于DBr并随后在600 K以上进行退火导致的沉积在硅上的氢化金刚石膜的改性。该过程导致在金刚石膜内形成碳化硅SiC,这通过在HREEL光谱中观察到117 meV的损耗峰和233 meV的第一谐波来证明。该金刚石表面改性被解释为是由硅载体热活化蚀刻的产物与氢化金刚石的反应产生的。 (c)2005 Elsevier B.V.保留所有权利。

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