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Surface structure of In/Si(111) studied by reflection high-energy positron diffraction

机译:反射高能正电子衍射研究In / Si(111)的表面结构

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摘要

We have investigated a quasi-one-dimensional structure of In/Si(111) surface using reflection high-energy positron diffraction (RHEPD), which is sensitive to the topmost surface structure under the total reflection condition. From the rocking curves, we found that In atoms are located at two different vertical positions, i.e., 0.99 A and 0.55 A from the Si zigzag chain in both 4 × 1 (210 K) and 8 × 2 (60 K) phases.
机译:我们已经研究了使用反射高能正电子衍射(RHEPD)的In / Si(111)表面的准一维结构,该结构对全反射条件下的最顶层表面结构很敏感。从摇摆曲线中,我们发现In原子在4×1(210 K)和8×2(60 K)相中位于两个Si字形链的垂直位置,即0.99 A和0.55 A.

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