Metal interface formation studied by high-energy reflection energy loss spectroscopy and electron Rutherford backscattering

摘要

We demonstrate that high-energy, high-resolution reflection electron energy loss spectroscopy can provide unique insights into interface formation, especially for the case where an extended interface is formed. By changing the geometry and/or electron energy the electronic structure can be probed over a range of thicknesses (from 10s of A to more than 1000 A). At the same time one resolves the elastically scattered electrons into different components, corresponding to scattering of atoms with different mass (so-called 'electron Rutherford backscattering'). Thus these high-energy REELS/elastic scattering experiments obtain information on both the electronic structure and the atomic composition of the overlayer formed.