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Correlated development of a (2×2) reconstruction and a charge accumulation layer on the InAs(111)-Bi surface

机译:InAs(111)-Bi表面上(2×2)重建和电荷积累层的相关发展

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摘要

We have studied the formation of a Bi-induced (2×2) reconstruction on the InAs( 111 )B surface. In connection to the development of the (2×2) reconstruction, a two dimensional charge accumulation layer located at the bottom of the InAs conduction band appears as seen through a photoemission structure at the Fermi level. Not well ordered Bi layers do not induce a charge accumulation. The Bi-induced reconstruction reduces the polarization of the pristine surface and changes the initial charge distribution. InAsBi alloying occurs below the surface where Bi acts as charge donor leading to the charge accumulation layer.
机译:我们已经研究了在InAs(111)B表面上Bi诱导(2×2)重建的形成。与(2×2)重建的发展有关,通过费米能级的光发射结构可以看到位于InAs导带底部的二维电荷积累层。排列不规则的Bi层不会引起电荷积累。 Bi诱导的重建减少了原始表面的极化并改变了初始电荷分布。 InAsBi合金化发生在Bi充当电荷供体的表面下方,从而导致电荷累积层。

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  • 来源
    《Surface Science》 |2011年第2期|p.12-17|共6页
  • 作者单位

    Materials Physics, ICT, MAP, Royal Institute of Technology, Electrum 229, 164 40 Kista, Sweden KTH, Royal Academy of Technology, Materialfysik, P.O. Box Electrum 229, SE-164 40 Kista, Sweden;

    MAX-lab. Lund University, SE-221 00 Lund, Sweden;

    rnMaterials Physics, ICT, MAP, Royal Institute of Technology, Electrum 229, 164 40 Kista, Sweden;

    rnMaterials Physics, ICT, MAP, Royal Institute of Technology, Electrum 229, 164 40 Kista, Sweden;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    adatoms; indium arsenide; bismuth; photoemission; 2 DEG;

    机译:原子砷化铟铋;光发射2度;

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