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Exploring the microstructural, optoelectronic properties of deposition time dependent Cu_2Sn(S,Se)_3 thin film synthesized by non-vacuum arrested precipitation technique

机译:探讨沉积时间依赖性Cu_2SN(S,Se)_3薄膜通过非真空停滞沉淀技术合成的微观结构,光电性能

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摘要

A novel chemical approach is utilized to synthesize Cu_2Sn(S,Se)_3 (CTSSe) thin films by non-vacuum arrested precipitation technique (APT) via controlled release of ions from complexed solution. Effect of deposition time on the microstructural and optoelectronic properties of CTSSe thin films was studied comprehensively. The optical absorption studies demonstrate a decrease in band gap energy from 1.84 to 1.62 eV as the deposition time increases. Nanocrystalline thin films with improved grain size were illustrated from XRD studies. The FESEM micrographs depict progress in surface microstructure from a bunch of nanospheres to aggregated and densely packed nanospheres. EDS spectrum confirms the stoichiometric formation of CU2Sn(S,Se)3 thin film. While, the XPS spectrum validates Cu~(1+), Sn~(4+), S~(2-), Se~(2-) valence states of the elements in CTSSe thin film. Furthermore, the photoelectrochemical cell performance of 0.3 % for bare CTSSe thin film was elucidated with cell configuration glass-FTO/CTSSe/(I~-/I~-_3)/graphite without any post deposition treatments. Also, the lowering of charge transfer resistance from EIS measurements corroborates for improved photoconversion efficiency. Finally, synthesis of CTSSe thin films by a simple APT finds a promising approach to fabricate efficient CTSSe photocathode for photovoltaic applications.
机译:一种新的化学方法用于通过来自络合溶液的离子的控制释放来合成Cu_2SN(SE,SE)_3(CTSSE)薄膜(APT)。综合研究了沉积时间对CTSSE薄膜微观结构和光电性的影响。由于沉积时间增加,光学吸收研究表明带隙能量从1.84到1.62 EV的降低。 XRD研究说明了具有改善的晶粒尺寸的纳米晶薄膜。 FeSEM显微照片描绘了从一束纳米球到聚集和密集填充纳米球的表面微观结构的进展。 EDS光谱证实了Cu2Sn(S,Se)3薄膜的化学计量形成。虽然,XPS光谱验证CU〜(1+),SN〜(4+),S〜(2-),SE〜(2-)〜(2-)〜(2-)价值在CTSSE薄膜中的元素。此外,用细胞构型玻璃-FTO / CTSSE /(I〜 - / I〜-_3)/石墨,阐明了裸CTSSE薄膜0.3%的光电化细胞性能。没有任何后沉积处理。而且,从EIS测量的电荷传递阻力的降低得到了改善的光电转换效率。最后,通过简单的APT合成CTSSE薄膜,发现了一种有望的方法来制造用于光伏应用的有效CTSSE光电阴极的方法。

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