首页> 外文期刊>Superlattices and microstructures >Effect of In_(0.70)Ga_(0.30)As quantum dot insertion in the middle cell of In_yGa_(1-y)P/In_xGa_(1-x)As/Ge triple-junction for solar cells
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Effect of In_(0.70)Ga_(0.30)As quantum dot insertion in the middle cell of In_yGa_(1-y)P/In_xGa_(1-x)As/Ge triple-junction for solar cells

机译:IN_(0.70)GA_(0.30)的效果为in_yga_(1-y)p / in_xga_(1-x)中间电池中的量子点插入为/ ge triple-nong-clanction用于太阳能电池

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摘要

This paper focuses on the simulation and optimization of electrical and structural properties of high efficiency InGaP/InGaAs/Ge triple junction solar cells that incorporate In_(0.70)Ga_(0.30)As quantum dots with in the GaAs middle cell material. Current density-voltage (J-V), external quantum efficiency (EQE) and capacitance-voltage (C-V) characteristics have been simulated and discussed. Results show that 30 pairs of Ino.70Gao.30As (QD)/GaAs (barrier) in the middle cell provide a relative enhancement of 13% in EQE in the 900-1000 nm wavelength range. This leads to a short-circuit current of 20 mA/cm~2, an open circuit voltage of 2.3 V, a fill factor of 81.73%, and a conversion efficiency of 39.03%. The C-V revealed that a relatively high number of interfacial states are present in the 3-J cell structure including the QD layers, which decreases the open circuit voltage. In this study we benefited 18% of relative efficiency.
机译:本文侧重于高效Ingap / InGaAs / Ge三交叉太阳能电池的电气和结构性能的模拟和优化,其包含IN_(0.70)Ga_(0.30)作为具有在GaAs中间细胞材料中的量子点。已经模拟和讨论了电流密度 - 电压(J-V),外部量子效率(EQE)和电容 - 电压(C-V)特性。结果表明,中间细胞中30对INO.70gaO.30AS(QD)/ GaAs(屏障)在900-1000nm波长范围内,在EQE中提供了13%的相对增强。这导致短路电流为20 mA / cm〜2,开路电压为2.3 V,填充因子为81.73%,转化效率为39.03%。 C-V显示,在包括QD层的3-J单元结构中存在相对较高数量的界面状态,其降低开路电压。在这项研究中,我们受益于18%的相对效率。

著录项

  • 来源
    《Superlattices and microstructures》 |2021年第1期|106760.1-106760.10|共10页
  • 作者

    A. Aissat; S. Nacer; J.P. Vilcot;

  • 作者单位

    Faculty of Technology University of Blida. 1 09000 Blida Algeria Institute of Electronics Microelectronics and Nanotechnology (IEMN) UMR CNRS 8520 France;

    Faculty of Technology University of Blida. 1 09000 Blida Algeria;

    Institute of Electronics Microelectronics and Nanotechnology (IEMN) UMR CNRS 8520 France;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    New materials; Quantum dot; Solar cell; Optoelectonic;

    机译:新材料;量子点;太阳能电池;Optoelectonic.;

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