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首页> 外文期刊>Superlattices and microstructures >Impurity-related polarizability and photoionization-cross section in GaAs-Ga_(1-x)Al_xAs double quantum wells under electric fields and hydrostatic pressure
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Impurity-related polarizability and photoionization-cross section in GaAs-Ga_(1-x)Al_xAs double quantum wells under electric fields and hydrostatic pressure

机译:电场和静水压力下GaAs-Ga_(1-x)Al_xAs双量子阱中与杂质有关的极化率和光电离截面

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摘要

Double quantum well heterostructures are quite important for the exploration of correlated electron states in two-dimensional systems. By using the variational procedure, within the effective-mass and parabolic-band approximations, the effects of both electric field and hydrostatic pressure on the shallow-donor-impurity related polarizability and photoionization cross-section in GaAs-Ga_(1-x)Al_xAs double asymmetric quantum wells are presented. The electric field is considered to be applied along the growth direction. It is found that the impurity binding energy and polarizability can be tuned by means of an applied external electric field or hydrostatic pressure in asymmetric double quantum wells, a behavior which could be used in the design and construction of semiconductor devices. The photoionization cross-section magnitude increases as the pressure and applied electric field are increased, except beyond the Γ-X crossover in the barrier material, where a decrease of the photoionization cross-section is expected due the smaller confinement of the impurity wave function.
机译:对于探索二维系统中的相关电子态,双量子阱异质结构非常重要。通过使用变分程序,在有效质量和抛物线近似下,电场和静水压力对GaAs-Ga_(1-x)Al_xAs中浅施主杂质相关的极化率和光电离截面的影响提出了双不对称量子阱。电场被认为是沿生长方向施加的。发现可以通过在不对称的双量子阱中施加的外部电场或流体静压力来调节杂质结合能和极化率,该行为可以用于半导体器件的设计和构造中。除势垒材料中的Γ-X交越点以外,光电离横截面的大小随压力和施加电场的增加而增加,在阻挡材料中,由于杂质波函数的限制较小,预计光电离横截面会减小。

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