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Effect of solvent volume on the physical properties of undoped and fluorine doped tin oxide films deposited using a low-cost spray technique

机译:溶剂体积对使用低成本喷涂技术沉积的无掺杂和氟掺杂的氧化锡膜的物理性能的影响

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Undoped and fluorine doped tin oxide films were deposited from starting solutions having different values of solvent volume (10-50 ml) by employing a low cost and simplified spray technique using perfume atomizer. X-ray diffraction studies showed that there was a change in the preferential orientation from (211) plane to (110) plane as the volume of the solvent was increased. The sheet resistance (R_(sh)) of undoped SnO_2 film was found to be minimum (13.58 KΩ/□) when the solvent volume was lesser (10 ml) and there was a sharp increase in R_(sh) for higher values of solvent volume. Interestingly, it was observed that while the R_(sh) increases sharply with the increase in solvent volume for undoped SnO_2 films, it decreases gradually in the case of fluorine doped SnO_2 films. The quantitative analysis of EDAX confirmed that the electrical resistivity of the sprayed tin oxide film was mainly governed by the number of oxygen vacancies and the interstitial incorporation of Sn atoms which in turn was governed by the impinging flux on the hot substrate. The films were found to have good optical characteristics suitable for opto-electronic devices.
机译:通过使用香料雾化器的低成本和简化的喷雾技术,从具有不同溶剂体积值(10-50ml)的起始溶液中沉积未掺杂和氟掺杂的氧化锡膜。 X射线衍射研究表明,随着溶剂体积的增加,从(211)面到(110)面的优先取向发生变化。当溶剂体积较小(10 ml)时,未掺杂的SnO_2薄膜的薄层电阻(R_(sh))最小(13.58KΩ/□),而对于更高的溶剂值,R_(sh)急剧增加体积。有趣的是,观察到,尽管对于未掺杂的SnO_2膜,R_(sh)随着溶剂体积的增加而急剧增加,但在掺氟的SnO_2膜的情况下,R_(sh)逐渐减小。 EDAX的定量分析证实,喷涂的氧化锡膜的电阻率主要受氧空位数和Sn原子间隙掺入的支配,而Sn原子的间隙掺入又受热基板上的冲击通量支配。发现这些膜具有适用于光电装置的良好光学特性。

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