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首页> 外文期刊>Superlattices and microstructures >ZnO nanorods on undoped and indium-doped ZnO thin films as a TCO layer on nonconductive glass for dye-sensitized solar cells
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ZnO nanorods on undoped and indium-doped ZnO thin films as a TCO layer on nonconductive glass for dye-sensitized solar cells

机译:未掺杂和铟掺杂的ZnO薄膜上的ZnO纳米棒作为染料敏化太阳能电池的非导电玻璃上的TCO层

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摘要

We present the growth of ZnO nanostructures on indium-doped ZnO film on a non-conductive glass substrate. The indium-doped ZnO film was used as the transparent conductive layer replaces the ITO layer. Various indium doping concentrations can change the electrical properties of ZnO film. The reduced electrical resistivity was investigated from 16.60 × 10~(-2) to 10 × 10~(-2) Ω cm. after doping with the optimal concentration of 2 wt% indium. It is found that the characteristic of ZnO nanostructures was strongly affected with indium doping concentration in ZnO films. The overall structural characteristics of ZnO ranged from 100-500 nm in size and 7-10 um in length and the branch-like structures can be revealed from the 2 wt% indium-doped ZnO film. The room-temperature photoluminescence spectra show a sharp ultraviolet band of 353 nm, indicated to the ZnO nanorods structure. The branch-like structures on the 2 wt% indium-doped film can be yielded the photovoltaic properties with a short-circuit current density of 3.96 mA/cm~2, an open-circuit voltage of 0.72 V, a fill factor of 20% and an overall power conversion efficiency of 0.56% under irradiance of 100 mW/cm~2 (AM 1.5 G).
机译:我们介绍了在非导电玻璃基板上的铟掺杂ZnO薄膜上ZnO纳米结构的生长。使用铟掺杂的ZnO膜作为透明导电层代替ITO层。各种铟掺杂浓度可以改变ZnO薄膜的电性能。研究了降低的电阻率,从16.60×10〜(-2)到10×10〜(-2)Ωcm。掺杂2 wt%铟的最佳浓度后。发现ZnO薄膜中铟掺杂浓度强烈影响ZnO纳米结构的特性。 ZnO的整体结构特征尺寸为100-500 nm,长度为7-10 um,并且从2 wt%的铟掺杂ZnO膜可以显示出分支状结构。室温光致发光光谱显示出353 nm的清晰紫外带,表明ZnO纳米棒结构。可以在2%重量的铟掺杂薄膜上形成分支结构,其短路电流密度为3.96 mA / cm〜2,开路电压为0.72 V,填充系数为20%在100 mW / cm〜2(AM 1.5 G)的辐照下,总功率转换效率为0.56%。

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